Plasma Deposition

Presentations

• Deposition of silicon-based thin films with atmospheric-pressure plasmas

  ORAL · Invited

  Oct. 7, 2022, 1:30 PM – Oct. 7, 2022, 2:00 PM

  Presenters

  • Matteo Gherardi

    • University of Bologna

  Authors

  • Matteo Gherardi

    • University of Bologna

  • Vittorio Colombo

    • University of Bologna

  • Romolo Laurita

    • University of Bologna

  • Giulia Laghi

    • University of Bologna

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• Process analysis of cracking a-C:H/CNP/a-C:H sandwich films under stress using nanoindentation

  ORAL

  Oct. 7, 2022, 2:00 PM – Oct. 7, 2022, 2:15 PM

  Presenters

  • Shinjiro Ono

    • Kyushu University

  Authors

  • Shinjiro Ono

    • Kyushu University

  • Takamasa Okumura

    • Kyushu University
    • Kyushu University, Japan

  • Kunihiro Kamataki

    • Kyushu Univ
    • Kyushu University
    • Kyushu University, Japan

  • Naoto Yamashita

    • Kyushu University
    • Kyushu University, Japan

  • Naho Itagaki

    • Kyushu University
    • Kyushu University, Japan

  • Kazunori Koga

    • Kyushu Univ
    • Kyushu University
    • Kyushu University, Japan

  • Masaharu Shiratani

    • Kyushu University
    • Kyushu University, Japan

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• Deposition of zinc oxide film using high power impulse magnetron sputtering

  ORAL

  Oct. 7, 2022, 2:15 PM – Oct. 7, 2022, 2:30 PM

  Presenters

  • Katsunori Nagahashi

    • Department of Electrical and Electronic Engineering, Meijo Universiry, Japan

  Authors

  • Katsunori Nagahashi

    • Department of Electrical and Electronic Engineering, Meijo Universiry, Japan

  • Takayuki Ohta

    • Meijo Univ
    • Meijo University, Shiogamaguchi 1-501, Tenpaku-ku, Nagoya 468-8502, Japan.
    • Department of Electrical and Electronic Engineering, Meijo University, Japan
    • Department of Electrical and Electronic Engineering, Meijo University, Japan.
    • Meijo university
    • Meijo University
    • Department of Electrical and Electronic Engineering, Meijo Universiry, Japan

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• Sputter epitaxy of Mg-doped ZnO films on sapphire substrates using inverted Stranski-Krastanov mode

  ORAL

  Oct. 7, 2022, 2:30 PM – Oct. 7, 2022, 2:45 PM

  Publication: D. Takahashi, et al., MRS Advances, https://doi.org/10.1557/s43580-022-00234-1

  Presenters

  • Masaharu Shiratani

    • Kyushu University
    • Kyushu University, Japan

  Authors

  • Masaharu Shiratani

    • Kyushu University
    • Kyushu University, Japan

  • Daichi Takahashi

    • Kyushu University

  • Naoto Yamashita

    • Kyushu University
    • Kyushu University, Japan

  • Naho Itagaki

    • Kyushu University

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• Deposition of Rutile TiO₂ Thin Films Using high power pulsed magnetron sputtering

  ORAL

  Oct. 7, 2022, 2:45 PM – Oct. 7, 2022, 3:00 PM

  Presenters

  • Miyuki Nishimura

    • Meijo University

  Authors

  • Miyuki Nishimura

    • Meijo University

  • Takayuki Ohta

    • Meijo Univ
    • Meijo University, Shiogamaguchi 1-501, Tenpaku-ku, Nagoya 468-8502, Japan.
    • Department of Electrical and Electronic Engineering, Meijo University, Japan
    • Department of Electrical and Electronic Engineering, Meijo University, Japan.
    • Meijo university
    • Meijo University
    • Department of Electrical and Electronic Engineering, Meijo Universiry, Japan

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• Next-generation Li-ion battery achieved by the low temperature plasma processes

  ORAL · Invited

  Oct. 7, 2022, 3:00 PM – Oct. 7, 2022, 3:30 PM

  Presenters

  • Giichiro Uchida

    • Meijo University

  Authors

  • Giichiro Uchida

    • Meijo University

  View abstract →