Modeling - Plasma Processing and Chemistry II

Presentations

• Two and Three Dimensional Inductive Coupled Plasma Remote Source Modeling with Single and Gas mixtures with Experimental Validation

  ORAL

  Oct. 6, 2022, 4:00 PM – Oct. 6, 2022, 4:15 PM

  Publication: Stephen E. Savas, Brad S. Mattson, Martin L. Hammond, Steven C. Selbrede, Patent US 6143129.
  
  AVS 2021

  Presenters

  • Abhra Roy

    • ESI Group

  Authors

  • Abhra Roy

    • ESI Group

  • Shawming Ma

    • Mattson Technology, Inc.

  • Luke Zhang

    • Mattson Technology, Inc.

  • Yun Yang

    • Mattson Technology, Inc.

  View abstract →

• Kinetic Study of Effects of RF Pulsing in Dual Frequency Capacitively Coupled Plasma

  ORAL

  Oct. 6, 2022, 4:15 PM – Oct. 6, 2022, 4:30 PM

  Presenters

  • Willca Villafana

    • Princeton Plasma Physics Laboratory
    • Prince Plasma Physics Laboratory

  Authors

  • Abhishek Verma

    • Applied Materials

  • Kallol Bera

    • Applied Materials
    • Applied Materials, Inc.

  • Shahid Rauf

    • Applied Materials Inc, USA
    • Applied Materials Inc
    • Applied Materials
    • Applied Materials Inc.

  • Dmytro Sydorenko

    • University of Alberta, Edmonton, Alberta T6G 2E1, Canada
    • University of Alberta, Canada

  • Igor D Kaganovich

    • Princeton Plasma Physics Laboratory, Princeton University, USA
    • Princeton Plasma Physics Laboratory

  • Willca Villafana

    • Princeton Plasma Physics Laboratory
    • Prince Plasma Physics Laboratory

  View abstract →

• Insights from Modeling Low-Pressure High-Voltage Dual-Frequency Capacitively Coupled Plasmas

  ORAL · Invited

  Oct. 6, 2022, 4:30 PM – Oct. 6, 2022, 5:00 PM

  Presenters

  • Amanda M Lietz

    • Sandia National Laboratories

  Authors

  • Amanda M Lietz

    • Sandia National Laboratories

  • Shahid Rauf

    • Applied Materials Inc, USA
    • Applied Materials Inc
    • Applied Materials
    • Applied Materials Inc.

  • Peng Tian

    • Applied Materials Inc, USA
    • Applied Materials Inc.
    • Applied Materials Inc

  • Jason Kenney

    • Applied Materials Inc, USA
    • Applied Materials Inc.

  • Matthew M Hopkins

    • Sandia National Laboratories
    • Sandia National Laboratory

  View abstract →

• Particle-in-Cell Techniques for Simulations of Magnetron Sputtering

  ORAL

  Oct. 6, 2022, 5:00 PM – Oct. 6, 2022, 5:15 PM

  Presenters

  • Joseph G Theis

    • University of Colorado, Boulder

  Authors

  • Joseph G Theis

    • University of Colorado, Boulder

  • Gregory R Werner

    • University of Colorado, Boulder

  • Thomas G Jenkins

    • Tech-X Corporation

  • Daniel Main

    • Tech-X Corporation

  • John R Cary

    • University of Colorado, Boulder

  View abstract →

• Hybrid Plasma Modeling of Low-Pressure Oxygen Plasma in Capacitively Coupled Plasma Reactors

  ORAL

  Oct. 6, 2022, 5:15 PM – Oct. 6, 2022, 5:30 PM

  Presenters

  • Sathya S Ganta

    • Applied Materials Inc

  Authors

  • Sathya S Ganta

    • Applied Materials Inc

  • Han Luo

    • Applied Materials Inc

  • Shahid Rauf

    • Applied Materials Inc, USA
    • Applied Materials Inc
    • Applied Materials
    • Applied Materials Inc.

  • Kallol Bera

    • Applied Materials
    • Applied Materials, Inc.

  View abstract →

• Hybrid Plasma Simulation of RF Hollow Cathode Discharge at Moderate Pressure

  ORAL

  Oct. 6, 2022, 5:30 PM – Oct. 6, 2022, 5:45 PM

  Presenters

  • Kallol Bera

    • Applied Materials
    • Applied Materials, Inc.

  Authors

  • Kallol Bera

    • Applied Materials
    • Applied Materials, Inc.

  • Abhishek Verma

    • Applied Materials

  • Sathya S Ganta

    • Applied Materials Inc

  • Shahid Rauf

    • Applied Materials Inc, USA
    • Applied Materials Inc
    • Applied Materials
    • Applied Materials Inc.

  • Ken Collins

    • Applied Materials, Inc.

  View abstract →

• Modelling of a Toroidal Wave Heated Plasma Source for the Remote Generation of Neutral Radicals

  ORAL

  Oct. 6, 2022, 5:45 PM – Oct. 6, 2022, 6:00 PM

  Presenters

  • Scott J Doyle

    • University of Michigan

  Authors

  • Scott J Doyle

    • University of Michigan

  • Amanda M Larson

    • MKS Instruments, Inc

  • Guy Rosenzweig

    • MKS Instruments, Inc.

  • Keith Koai

    • MKS Instruments, Inc.

  • Mark J Kushner

    • University of Michigan
    • Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Ave, Ann Arbor, MI 48109-2122, United States of America

  View abstract →