Plasma Applications
FOCUS · TF12 · ID: 14059
Presentations
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Microplasma-Driven Atomic Layer Deposition of Aluminum Oxide Etch-Free Patterning, and Gallium Oxide-Based Flexible DUV Photodetector
ORAL
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Presenters
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Jinhong Kim
- University of Illinois at Urbana-Champai
Authors
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Jinhong Kim
- University of Illinois at Urbana-Champai
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Dane J Sievers
- University of Illinois Urbana Champaign
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Sung-Jin Park
- University of Illinois, Eden Park Illumination
- University of Illinois at Urbana-Champai
- University of Illinois
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J. Gary Eden
- University of Illinois at Urbana-Champaign
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Optimizing the deposition rate and ionized flux fraction of a high power impulse magnetron sputtering discharge
ORAL · Invited
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Publication: M. Rudolph, N. Brenning, M. A. Raadu, H. Hajihoseini,J. T. Gudmundsson, A. Anders, and D. Lundin, Plasma Sources Science and Technology 29, 05LT01 (2020).
N. Brenning, A. Butler, H. Hajihoseini, M. Rudolph, M. A.Raadu, J. T. Gudmundsson, T. Minea, and D. Lundin, Journal of Vacuum Science and Technology A38, 033008 (2020).
N. Brenning, H. Hajihoseini, M. Rudolph, M. A. Raadu, J. T. Gudmundsson, T. M. Minea and D. Lundin, Plasma Sources Science and Technology 30, 015015 (2021).Presenters
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Martin Rudolph
- Leibniz Institute of Surface Engineering (IOM), Leipzig, Germany
Authors
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Martin Rudolph
- Leibniz Institute of Surface Engineering (IOM), Leipzig, Germany
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Nils Brenning
- KTH Royal Institute of Technology, Stockholm, Sweden
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Hamidreza Hajihoseini
- Industrial Focus Group XUV Optics, MESA+ Institute for Nanotechnology, University of Twente, Enschede, The Netherlands
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Michael A Raadu
- KTH Royal Institute of Technology, Stockholm, Sweden
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Tiberiu M Minea
- Laboratoire de Physique des Gaz et Plasmas, UMR 8578 CNRS, Université Paris–Saclay, Orsay, France
- Paris Saclay University, LPGP, CNRS
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Andre Anders
- Leibniz Institute of Surface Engineering (IOM), Leipzig, Germany
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Jon T Gudmundsson
- Science Institute, University of Iceland, Reykjavik, Iceland
- Univ of Iceland
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Daniel Lundin
- Plasma and Coatings Physics Division, Linköping University, Linköping, Sweden
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Plasma Ion Doping for Semiconductor Applications
ORAL
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Presenters
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Hongwen Yan
- IBM TJ Watson Research Center
Authors
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Hongwen Yan
- IBM TJ Watson Research Center
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Hiro Miyazoe
- IBM Research, T.J. Watson Research Center
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Marinus Hopstaken
- IBM Research, T.J. Watson Research Center
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Sebastian Engelmann
- IBM Research, T.J. Watson Research Center
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Takashi Ando
- IBM Research, T.J. Watson Research Center
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Kevin Chan
- na
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KrCl<sup>*</sup> Far UV-C Microplasma Flat Lamp: Prevention of Airborne Transmission of Pathogens with Human Safety
ORAL
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Presenters
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Sung-Jin Park
- University of Illinois, Eden Park Illumination
- University of Illinois at Urbana-Champai
- University of Illinois
Authors
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Sung-Jin Park
- University of Illinois, Eden Park Illumination
- University of Illinois at Urbana-Champai
- University of Illinois
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James G Eden
- University of Illinois
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Water Interacting with Nanostructured Plasma Polymer Films
ORAL
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Publication: E. Bülbül, D. Hegemann, K. Ataka, S. Lehner, J. Heberle, M. Heuberger, Surf. Interfaces 23, 2021, 100922
D. Hegemann, E. Bülbül, B. Hanselmann, U. Schütz, M. Amberg, S. Gaiser, Plasma Process. Polym. 18, 2021, e2000176Presenters
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Dirk Hegemann
- Empa, Swiss Federal Laboratory for Mater
Authors
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Dirk Hegemann
- Empa, Swiss Federal Laboratory for Mater
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Plasma enhanced chemical vapour depositon of ZrO<sub>2</sub> based layers
ORAL
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Presenters
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Philipp A Maaß
- Ruhr-University Bochum
- Ruhr-University bochum
Authors
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Philipp A Maaß
- Ruhr-University Bochum
- Ruhr-University bochum
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Vitali Bedarev
- Ruhr-University Bochum
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Sebastian M. J Beer
- Ruhr-University Bochum
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Marina Prenzel
- Ruhr-University Bochum
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Marc Böke
- Ruhr-University Bochum
- Experimental Physics II, Faculty of Physics and Astronomy, Ruhr-University Bochum, Germany
- 1Ruhr-University Bochum, Experimental Physics II
- RUB Physik EPII; CRC 1316
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Anjana Devi
- Ruhr-University Bochum
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Achim von Keudell
- Ruhr-University Bochum
- Experimental Physics II, Bochum
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