Plasma Etch

Presentations

• An In-house Rigorous Etching Model for Process Recipe Tuning

  ORAL · Invited

  Oct. 7, 2021, 10:15 AM – Oct. 7, 2021, 10:45 AM

  Presenters

  • Wei Tian

    • TSMC

  Authors

  • Wei Tian

    • TSMC

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• In-plasma, vacuum ultraviolet photon-assisted etching of silicon

  ORAL

  Oct. 7, 2021, 10:45 AM – Oct. 7, 2021, 11:00 AM

  Presenters

  • Vincent Donnelly

    • University of Houston

  Authors

  • Vincent Donnelly

    • University of Houston

  • Linfeng Du

    • University of Houston

  • Emilia Hirsch

    • University of Houston

  • Demetre J Economou

    • University of Houston

  • Paul Ruchhoeft

    • University of Houston

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• Molecular dynamic simulation of glancing-angle scatterings on different materials in a high aspect ratio etching process

  ORAL

  Oct. 7, 2021, 11:00 AM – Oct. 7, 2021, 11:15 AM

  Presenters

  • Yao Du

    • North Carolina State University

  Authors

  • Yao Du

    • North Carolina State University

  • Steven Shannon

    • North Carolina State University

  • Sang Ki Nam

    • Samsung Electronics
    • Samsung Mechatronics R&D center
    • Samsung Mechatronics R&D Center
    • Samsung Electronics Co.

  • Hoki Lee

    • Samsung Mechatronics R&D center
    • Samsung Mechatronics R&D Center

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• Mitigating the effects of surface charging during high aspect ratio plasma etching using voltage waveform tailoring

  ORAL

  Oct. 7, 2021, 11:15 AM – Oct. 7, 2021, 11:30 AM

  Presenters

  • Florian Krüger

    • University of Michigan

  Authors

  • Florian Krüger

    • University of Michigan

  • Hyunjae Lee

    • Samsung Electronics

  • Sang Ki Nam

    • Samsung Electronics
    • Samsung Mechatronics R&D center
    • Samsung Mechatronics R&D Center
    • Samsung Electronics Co.

  • Mark J Kushner

    • University of Michigan
    • University of Michigan, Ann Arbor
    • Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Ave, Ann Arbor, MI 48109-2122, United States of America

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• Computational study of plasma dynamics and reactive chemistry in a low-pressure inductively coupled CF₄/O₂ plasma

  ORAL

  Oct. 7, 2021, 11:30 AM – Oct. 7, 2021, 11:45 AM

  Presenters

  • Dmitry Levko

    • Esgee Technologies

  Authors

  • Dmitry Levko

    • Esgee Technologies

  • Chandrashekar Shukla

    • Esgee Technologies

  • Rochan Upadhyay

    • Esgee Technologies

  • Laxminarayan L Raja

    • University of Texas at Austin
    • The University of Texas at Austin

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• E-H Transitions in Ar/O₂ Inductively Coupled Plasmas for Varying Antenna Aspect Ratio - Experiment

  ORAL

  Oct. 7, 2021, 11:45 AM – Oct. 7, 2021, 12:00 PM

  Presenters

  • Yuchen Qian

    • University of California at Los Angeles
    • California State University, Los Angeles
    • University of California, Los Angeles

  Authors

  • Walter N Gekelman

    • University of California at Los Angeles
    • University of California, Los Angeles

  • Patrick Pribyl

    • University of California, Los Angeles

  • Yuchen Qian

    • University of California at Los Angeles
    • California State University, Los Angeles
    • University of California, Los Angeles

  • Alex Paterson

    • Lam Research Corp.
    • Lam Research Corp

  • Tugba Piskin

    • University of Michigan

  • Mark J Kushner

    • University of Michigan
    • University of Michigan, Ann Arbor
    • Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Ave, Ann Arbor, MI 48109-2122, United States of America

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• Consequences of photodetachment in pulsed Ar/O₂ and Ar/Cl₂ inductively coupled plasmas

  ORAL

  Oct. 7, 2021, 12:00 PM – Oct. 7, 2021, 12:15 PM

  Presenters

  • Tugba Piskin

    • University of Michigan

  Authors

  • Tugba Piskin

    • University of Michigan

  • Yuchen Qian

    • University of California at Los Angeles
    • California State University, Los Angeles
    • University of California, Los Angeles

  • Patrick Pribyl

    • University of California at Los Angeles
    • University of California, Los Angeles

  • Walter N Gekelman

    • University of California at Los Angeles
    • University of California, Los Angeles

  • Mark J Kushner

    • University of Michigan
    • University of Michigan, Ann Arbor
    • Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Ave, Ann Arbor, MI 48109-2122, United States of America

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• Evaluation of charge density at hole bottom of capillary plates in a pulsed dual-frequency capacitively coupled plasma

  ORAL

  Oct. 7, 2021, 12:15 PM – Oct. 7, 2021, 12:30 PM

  Presenters

  • Haruka Suzuki

    • Nagoya Univ
    • Nagoya Univ.
    • Nagoya University; cLPS, Nagoya University

  Authors

  • Haruka Suzuki

    • Nagoya Univ
    • Nagoya Univ.
    • Nagoya University; cLPS, Nagoya University

  • Makoto Moriyama

    • Nagoya Univ.

  • Naoya Nakahara

    • Nagoya Univ.

  • Hirotaka Toyoda

    • Nagoya Univ., NIST
    • Department of Electronics, Nagoya University; cLPS, Nagoya University; National Institute for Fusion Science

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