Plasma-surface Interactions I
ORAL · GT52 · ID: 14164
Presentations
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Multiscale simulation on plasma-surface interaction: mitigation of leakage current at high-k metal oxide interface
ORAL
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Presenters
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Byungjo Kim
- Samsung Electronics Co.
Authors
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Byungjo Kim
- Samsung Electronics Co.
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Muyoung Kim
- Samsung Electronics Co.
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Suyoung Yoo
- Samsung Electronics Co.
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Sang Ki Nam
- Samsung Electronics
- Samsung Mechatronics R&D center
- Samsung Mechatronics R&D Center
- Samsung Electronics Co.
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Ion-induced secondary electron emission coefficient of metal surfaces analysed in an ion beam experiment
ORAL
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Presenters
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Rahel Buschhaus
- Experimental Physics II, Bochum
Authors
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Rahel Buschhaus
- Experimental Physics II, Bochum
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Achim von Keudell
- Ruhr-University Bochum
- Experimental Physics II, Bochum
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Study of plasma-surface interactions of CO2-CH4 plasma on CeO2 using in situ Infrared Transmission experiments
ORAL
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Publication: N/A
Presenters
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Carolina A Garcia Soto
- Laboratoire de Physique des Plasmas, Ecole Polytechnique
Authors
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Carolina A Garcia Soto
- Laboratoire de Physique des Plasmas, Ecole Polytechnique
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Edmond Baratte
- Laboratoire de Physique des Plasmas (LPP), CNRS, Sorbonne Université, Ecole Polytechnique Institut Polytechnique de Paris, 91128 Palaiseau France
- Laboratoire de Physique des Plasmas, Ecole Polytechnique
- Laboratoire de Physique des Plasmas (UMR 7648), CNRS, Univ. Paris Saclay, Sorbonne Université, École Polytechnique, France
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Vasile I Parvulescu
- University of Bucharest
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Olivier Guaitella
- Laboratoire de Physique des Plasmas (LPP), CNRS, Sorbonne Université, Ecole Polytechnique Institut Polytechnique de Paris, 91128 Palaiseau France
- Laboratory of Plasma Physics, École Polytechnique
- Laboratoire de Physique des Plasmas
- Laboratoire de Physique des Plasmas, Ecole Polytechnique
- Laboratoire de Physique des Plasmas (UMR 7648), CNRS, Univ. Paris Saclay, Sorbonne Université, École Polytechnique, France
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Plasma Diagnostics on an Atmospheric Pressure DC Microplasma Discharge Intended for in situ TEM Integration
ORAL
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Presenters
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Luka Hansen
- Institute of Experimental and Applied Physics, Kiel University, Germany
Authors
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Luka Hansen
- Institute of Experimental and Applied Physics, Kiel University, Germany
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Niklas Kohlmann
- Institute of Materials Science, Kiel University, Germany
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Ulrich Schürmann
- Institute of Materials Science, Kiel University, Germany
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Lorenz Kienle
- Institute of Materials Science, Kiel University, Germany
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Holger Kersten
- Institute of Experimental and Applied Physics, Kiel University, Germany
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From the role of Ar ions in the sputter deposition of Al films to a comprehensive surface surrogate model
ORAL
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Publication: T. Gergs, T. Mussenbrock, and J. Trieschmann, A Molecular Dynamics Study on the Role of Ar Ions in the Sputter Deposition of Al Thin Films, in preparation.
T. Gergs, and J. Trieschmann, A comprehensive surface surrogate model for sputtering processes based on conditional variational autoencoder, in preparation.Presenters
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Tobias Gergs
- Ruhr University Bochum
Authors
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Tobias Gergs
- Ruhr University Bochum
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Thomas Mussenbrock
- Ruhr University Bochum
- Bochum University
- Ruhr Univ Bochum
- Ruhr-University Bochum, Germany
- Ruhr-University Bochum
- Ruhr University Bochum, 44780 Bochum, Germany
- Ruhr University, Bochum, Germany
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Jan Trieschmann
- Brandenburg University of Technology
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