Capacitively Coupled Plasmas I
FOCUS · DT21 · ID: 14015
Presentations
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Ion Energy and Density Profile Control by Focus Ring and Associated External Circuit on Capacitively Coupled Plasma
ORAL
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Presenters
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Yuhua Xiao
- North Carolina State University
Authors
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Yuhua Xiao
- North Carolina State University
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Joel Brandon
- North Carolina State University
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Sang Ki Nam
- Samsung Electronics
- Samsung Mechatronics R&D center
- Samsung Mechatronics R&D Center
- Samsung Electronics Co.
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Kiho Bae
- Samsung Mechatronics R&D Center
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Jang-Yeob Lee
- Samsung Mechatronics R&D Center
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Steven Shannon
- North Carolina State University
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Frequency effects on nonlinear harmonic excitations in an asymmetrically-driven capacitive discharge
ORAL
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Presenters
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Jian-Kai Liu
- Dalian University of Technology; University of California, Berkeley
Authors
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Jian-Kai Liu
- Dalian University of Technology; University of California, Berkeley
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Emi Kawamura
- University of California, Berkeley
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Michael A Lieberman
- University of California, Berkeley
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Allan J Lichtenberg
- University of California, Berkeley
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You-Nian Wang
- School of Physics, Dalian University of Technology, Dalian 116024, People's Republic of China
- Dalian University of Technology
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On the Similarity and Scaling Laws in Low-Pressure Capacitive Radio Frequency Discharges
ORAL
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Publication: [1]. Yangyang Fu, Bocong Zheng*, De-Qi Wen, Peng Zhang, Qi Hua Fan, and John P. Verboncoeur, "Similarity law and frequency scaling in low-pressure capacitive radio frequency plasmas", Appl. Phys. Lett. 117, 204101 (2020).
[2]. Yangyang Fu, Bocong Zheng, Peng Zhang, Qi Hua Fan, John P. Verboncoeur, and Xinxin Wang, "Similarity of capacitive radio frequency discharges in nonlocal regimes", Phys. Plasmas 27, 113501 (2020).
[3]. Yangyang Fu, Bocong Zheng, De-Qi Wen, Peng Zhang, Qi Hua Fan, and John P. Verboncoeur, "High-energy ballistic electrons in low-pressure radio-frequency plasmas", Plasma Sources Sci. Technol. 29, 09LT01 (2020).Presenters
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Yangyang Fu
- Tsinghua University
Authors
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Yangyang Fu
- Tsinghua University
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Bocong Zheng
- Fraunhofer USA
- Fruahnhofer Institute
- Michigan State University
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Huihui Wang
- Tsinghua University
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Peng Zhang
- Michigan State University
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Qi Hua Fan
- Michigan State University
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Xinxin Wang
- Tsinghua University
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John P. Verboncoeur
- Michigan State University
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2D PIC simulations of geometrically asymmetric capacitive RF plasmas driven by tailored voltage waveforms
ORAL · Invited
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Publication: Li Wang et al 2021 Plasma Sources Sci. Technol. 30 054001
Presenters
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Li Wang
- Ruhr University Bochum & Dalian University of Technology
- Ruhr University Bochum and Dalian University of Technology
Authors
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Li Wang
- Ruhr University Bochum & Dalian University of Technology
- Ruhr University Bochum and Dalian University of Technology
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Peter Hartmann
- Wigner Research Center for Physics & Baylor University
- Wigner Research Center for Physics, Budapest, Hungary
- Wigner Research Center for Physics and Baylor University
- Wigner Research Center for Physics
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Zoltan Donko
- Institute for Solid State Physics and Optics, Wigner Research Center for Physics, Hungary
- Wigner Research Center for Physics
- Wigner Research Centre for Physics
- Wigner Research Center
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Yuan-Hong Song
- Dalian University of Technology
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Julian Schulze
- University of Bochum, Germany
- Ruhr-Universität Bochum, Germany
- Ruhr Univ Bochum
- Bochum University
- Ruhr University Bochum & Dalian University of Technology
- Ruhr University Bochum, 44780 Bochum, Germany
- Ruhr University Bochum
- Ruhr University Bochum and Dalian University of Technology
- Ruhr-University Bochum, Germany; Dalian University of Technology, China
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Tuning the Ion Energy Distribution by Tailored Low-frequency Voltage Waveforms in CCPs
ORAL
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Presenters
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Peter Hartmann
- Wigner Research Center for Physics & Baylor University
- Wigner Research Center for Physics, Budapest, Hungary
- Wigner Research Center for Physics and Baylor University
- Wigner Research Center for Physics
Authors
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Peter Hartmann
- Wigner Research Center for Physics & Baylor University
- Wigner Research Center for Physics, Budapest, Hungary
- Wigner Research Center for Physics and Baylor University
- Wigner Research Center for Physics
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Ihor Korolov
- Ruhr Univ Bochum
- Institute of Electrical Engineering and Plasma Technology, Faculty of Electrical Engineering and Information Technology, Ruhr-University Bochum, Germany
- Ruhr-Universität Bochum, Germany
- Ruhr University Bochum
- Bochum University
- Ruhr Univ Bochum, Germany
- Ruhr-University Bochum
- Ruhr-University Bochum, Germany
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Julian Schulze
- Ruhr University Bochum
- Institute of Electrical Engineering and Plasma Technology, Faculty of Electrical Engineering and Information Technology, Ruhr-University Bochum, Germany
- Ruhr Univ Bochum
- Ruhr-University Bochum, Germany; Dalian University of Technology, China
- Ruhr University Bochum, Dalian University of Technology
- Ruch Univ Bochum, Germany
- Ruhr-University Bochum
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Wouter van Gennip
- Prodrive Technologies, Eindhoven, The Netherlands
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Koen Buskes
- Prodrive Technologies, Eindhoven, The Netherlands
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The effects of surface processes on the plasma parameters in low-pressure multi-frequency capacitive discharges
ORAL
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Presenters
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Aranka Derzsi
- Wigner Research Centre for Physics, Hungary
- Wigner Research Centre for Physics, Hung
Authors
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Aranka Derzsi
- Wigner Research Centre for Physics, Hungary
- Wigner Research Centre for Physics, Hung
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Benedek Horvath
- Wigner Research Center for Physics
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Zoltan Donko
- Institute for Solid State Physics and Optics, Wigner Research Center for Physics, Hungary
- Wigner Research Center for Physics
- Wigner Research Centre for Physics
- Wigner Research Center
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Julian Schulze
- Ruhr University Bochum
- Institute of Electrical Engineering and Plasma Technology, Faculty of Electrical Engineering and Information Technology, Ruhr-University Bochum, Germany
- Ruhr Univ Bochum
- Ruhr-University Bochum, Germany; Dalian University of Technology, China
- Ruhr University Bochum, Dalian University of Technology
- Ruch Univ Bochum, Germany
- Ruhr-University Bochum
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Structural and Electrical Methods for Enhancing Homogeneity in Intermediate Pressure Capacitively Coupled Plasma Processing Sources
ORAL
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Presenters
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Scott J Doyle
- Department of Atomic, Molecular and Nuclear Physics, University of Seville, Avda. Reina Mercedes, E-41012 Seville, Spain
- Universidad de Sevilla
Authors
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Scott J Doyle
- Department of Atomic, Molecular and Nuclear Physics, University of Seville, Avda. Reina Mercedes, E-41012 Seville, Spain
- Universidad de Sevilla
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Gregory J Smith
- York Plasma Institute, Department of Physics, University of York, Heslington, York, YO10 5DD, UK
- University of York
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Gregory Daly
- Oxford Instruments Plasma Technology
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Geoff Hassall
- Oxford Instruments Plasma Technology
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James P Dedrick
- York Plasma Institute, Department of Physics, University of York, Heslington, York, YO10 5DD, UK
- University of York
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Electron power absorption in radio frequency driven capacitively coupled chlorine discharge
ORAL
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Publication: [1] A Proto and J T Gudmundsson, Plasma Sources Sci. Technol. 30 (2021) 065009
[2] G A Skarphedinsson1 and J T Gudmundsson, Plasma Sources Sci. Technol. 29 (2020) 084004Presenters
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Jon T Gudmundsson
- Science Institute, University of Iceland, Reykjavik, Iceland
- Univ of Iceland
Authors
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Jon T Gudmundsson
- Science Institute, University of Iceland, Reykjavik, Iceland
- Univ of Iceland
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Andrea Proto
- University of Iceland
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Gardar A Skarphedinsson
- University of Iceland
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