Plasma Deposition II

Presentations

• Plasma ALD strategies for area selective deposition

  COFFEE_KLATCH · Invited

  Oct. 7, 2020, 3:00 PM – Oct. 7, 2020, 3:30 PM

  Authors

  • Christophe Vallee

    • UGA (LTM/CNRS)

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• Microwave Plasma Deposition of N-doped Diamond Films- Experiments \& Modelling

  ORAL

  Oct. 7, 2020, 3:30 PM – Oct. 7, 2020, 3:45 PM

  Authors

  • Michael Bradley

    • University of Saskatchewan

  • Hammed Ejalonibu

    • University of Saskatchewan

  • Gordon Sarty

    • University of Saskatchewan

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• Area Selective Plasma Enhanced Chemical Vapor Deposition of Silicon on Silicon Nitride and Aluminum Oxide.

  ORAL

  Oct. 7, 2020, 3:45 PM – Oct. 7, 2020, 4:00 PM

  Authors

  • Ghewa Akiki

    • LPICM-CNRS, Ecole Polytechnique, Institut Polytechnique de Paris

  • Daniel Suchet

    • LPICM-CNRS, Ecole Polytechnique, Institut Polytechnique de Paris

  • Dmitri Daineka

    • LPICM-CNRS, Ecole Polytechnique, Institut Polytechnique de Paris

  • Sergej Filonovich

    • TOTAL GRP

  • Pavel Bulkin

    • LPICM-CNRS, Ecole Polytechnique, Institut Polytechnique de Paris

  • Erik Johnson

    • LPICM-CNRS, Ecole Polytechnique, Institut Polytechnique de Paris

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• Plasma Ion Doping for Semiconductor Applications

  ORAL

  Oct. 7, 2020, 4:00 PM – Oct. 7, 2020, 4:15 PM

  Authors

  • Hongwen Yan

    • IBM
    • IBM Research

  • Hiroyuki Miyazoe

    • IBM

  • Marinus Hopstaken

    • IBM

  • Sebastian Engelmann

    • IBM

  • Takashi Ando

    • IBM

  • Kevin Chan

    • Retired

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