Capacitively Coupled Plasmas I

Presentations

• Operation characteristics of high-Voltage, low-pressure CCPs targeting etching applications

  COFFEE_KLATCH · Invited

  Oct. 6, 2020, 10:00 AM – Oct. 6, 2020, 10:30 AM

  Authors

  • Peter Hartmann

    • Wigner Research Center, Hungary
    • Wigner Research Centre for Physics

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• Nonlinear standing wave effect and plasma uniformity in very-high-frequency capacitively coupled plasmas

  COFFEE_KLATCH · Invited

  Oct. 6, 2020, 10:30 AM – Oct. 6, 2020, 11:00 AM

  Authors

  • Yong-Xin Liu

    • Dalian University of Technology

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• The effect of gas pressure on the nonlinear harmonic excitation in very high frequency asymmetric capacitive discharges

  ORAL

  Oct. 6, 2020, 11:00 AM – Oct. 6, 2020, 11:15 AM

  Authors

  • Jian-Kai Liu

    • Dalian University of Technology; University of California, Berkeley

  • Emi Kawamura

    • University of California, Berkeley

  • Michael Lieberman

    • University of California, Berkeley

  • Allan Lichtenberg

    • University of California, Berkeley

  • You-Nian Wang

    • Dalian University of Technology

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• Experimental verification of 1d3v PIC/MCC simulations of capacitive RF plasmas operated in argon

  ORAL

  Oct. 6, 2020, 11:15 AM – Oct. 6, 2020, 11:30 AM

  Authors

  • David A. Schulenberg

    • Ruhr-University Bochum

  • Ihor Korolov

    • Ruhr-University Bochum

  • Zoltan Donko

    • Wigner Research Centre for Physics, Budapest

  • Aranka Derzsi

    • Wigner Research Centre for Physics, Budapest

  • Julian Schulze

    • Ruhr-University Bochum; Dalian University of Technology
    • Ruhr-University Bochum, Germany
    • Ruhr Univ Bochum

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• The difference between electron heating and power absorption in capacitively coupled plasmas

  ORAL

  Oct. 6, 2020, 11:30 AM – Oct. 6, 2020, 11:45 AM

  Authors

  • Sebastian Wilczek

    • Ruhr University Bochum

  • Julian Schulze

    • Ruhr University Bochum
    • Ruhr-University Bochum, Dalian University of Technology
    • Ruhr-University Bochum
    • Ruhr University, Bochum, Germany

  • Ralf Peter Brinkmann

    • Ruhr University Bochum
    • Ruhr University, Bochum, Germany
    • Ruhr-University Bochum

  • Zoltán Donkó

    • Wigner Research Centre for Physics

  • Jan Trischmann

    • Brandenburg University of Technology Cottbus-Senftenberg

  • Thomas Mussenbrock

    • Brandenburg University of Technology Cottbus-Senftenberg

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• Electrical Asymmetry Effect in Very High Frequency Capacitively Coupled Plasmas

  ORAL

  Oct. 6, 2020, 11:45 AM – Oct. 6, 2020, 12:00 PM

  Authors

  • Xiaopu Li

    • Applied Materials, Inc.
    • Applied Materials Inc

  • Kallol Bera

    • Applied Materials Inc

  • Shahid Rauf

    • Applied Materials Inc

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• Effects of Focus Ring in Capacitively Coupled Plasma Based on 1D Circuit Modeling and Experiments

  ORAL

  Oct. 6, 2020, 12:00 PM – Oct. 6, 2020, 12:15 PM

  Authors

  • Yuhua Xiao

    • North Carolina State University

  • Yao Du

    • North Carolina State University

  • Sang-Ki Nam

    • Samsung Mechatronics Research Group

  • Steven Shannon

    • North Carolina State University

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• High-Energy Ballistic Electrons in Low-Pressure Radio-Frequency Plasmas.

  ORAL

  Oct. 6, 2020, 12:15 PM – Oct. 6, 2020, 12:30 PM

  Authors

  • Yangyang Fu

    • Michigan State Univ
    • Michigan State University

  • Bocong Zheng

    • Michigan State University

  • De-Qi Wen

    • Michigan State Univ
    • Michigan State Unversity
    • Michigan State University

  • Peng Zhang

    • ECE, Michigan State University, 48824, USA
    • Michigan State University
    • ECE, Michigan State University

  • Qi Hua Fan

    • Michigan State University

  • John P. Verboncoeur

    • Michigan State University

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