Workshop IV: Plasma Enhanced Atomic Layer Etch/Atomic Layer Deposition

Presentations

• Plasma Enhanced Atomic Layer Etch/Atomic Layer Deposition

  ORAL · Invited

  Oct. 5, 2020, 12:45 PM – Oct. 5, 2020, 1:00 PM

  Authors

  • Sebastian Engelmann

    • IBM Research

  • Hongwen Yan

    • IBM
    • IBM Research

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• Plasma chemistry data and chemistry set optimisation approach for ALD/ALE modeling

  ORAL

  Oct. 5, 2020, 1:00 PM – Oct. 5, 2020, 1:45 PM

  Authors

  • Anna Dzarasova

    • Quantemol Limited

  • Martin Hanicinec

    • University College London & Quantemol Ltd

  • Sebastian Mohr

    • Quantemol Limited

  • Jonathan Tennyson

    • University College London

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• Atomic Layer Etching of Metals with Anisotropy, Specificity and Selectivity

  ORAL

  Oct. 5, 2020, 1:45 PM – Oct. 5, 2020, 2:30 PM

  Authors

  • Jane Chang

    • UCLA

  • Yantao Xia

    • UCLA

  • Philippe Sautet

    • UCLA

  • Xia Sang

    • UCLA

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• Reaction Network Analysis for Atomic Layer Deposition Processes

  ORAL · Invited

  Oct. 5, 2020, 2:30 PM – Oct. 5, 2020, 3:15 PM

  Authors

  • Raymond Adomaitis

    • University of Maryland

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• Selective Etching Promoted by the Area Selective Growth of Deactivating Polymers.

  ORAL

  Oct. 5, 2020, 3:15 PM – Oct. 5, 2020, 4:00 PM

  Authors

  • Rudy Wojtecki

    • IBM Research | Almaden

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• Discussion (4:00pm - 4:30pm)

  ORAL

  Oct. 5, 2020, 4:00 PM – Oct. 5, 2020, 4:30 PM

  Authors

  • Abstract APS

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