Diagnostics II (Electrical)
FOCUS · TF3 ·
Presentations
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Expanding the Functionality of Plasma Diagnostics
COFFEE_KLATCH · Invited
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Authors
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Steven Shannon
- North Carolina State University
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Model-Experiment Comparison of Plasma Characteristics for Moderate Pressure Capacitively Coupled Discharges
ORAL
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Authors
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David Peterson
- Applied Materials Inc., 1140 E. Arques Avenue Sunnyvale, California 94085
- North Carolina State University
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Steven C. Shannon
- North Carolina State University
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Wei Tian
- Applied Materials Inc., 1140 E. Arques Avenue Sunnyvale, California 94085
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Philip A. Kraus
- Applied Materials Inc., 1140 E. Arques Avenue Sunnyvale, California 94085
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Kallol Bera
- Applied Materials Inc., 1140 E. Arques Avenue Sunnyvale, California 94085
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Shahid Rauf
- Applied Materials Inc., 1140 E. Arques Avenue Sunnyvale, California 94085
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Thai Cheng Chua
- Applied Materials Inc., 1140 E. Arques Avenue Sunnyvale, California 94085
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Travis Koh
- Applied Materials Inc., 1140 E. Arques Avenue Sunnyvale, California 94085
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David Peterson
- Applied Materials Inc., 1140 E. Arques Avenue Sunnyvale, California 94085
- North Carolina State University
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Langmuir Probe Modifications for Use in Pulsed Plasma
ORAL
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Authors
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Alex Press
- The University of Texas at Dallas
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Keith Hernandez
- The University of Texas at Dallas
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Matthew Goeckner
- The University of Texas at Dallas
- Univ of Texas, Dallas
- University of Texas at Dallas
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Lawrence Overzet
- The University of Texas at Dallas
- Univ of Texas, Dallas
- University of Texas at Dallas
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Probe tip length effect of cutoff probe for measurement of high density plasma based on a new circuit cutoff model
ORAL
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Authors
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SiJun Kim
- Applied Physics lab for PLasma Engineering (APPLE), Department of Physics, Chungnam Natl Univ
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JangJae Lee
- Applied Physics lab for PLasma Engineering (APPLE), Department of Physics, Chungnam Natl Univ
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DaeWoong Kim
- Korea Institute of Machinery and Materials (KIMM)
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Jung-Hyung Kim
- Korea Research Institute of Standards and Science (KRISS)
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ShinJae You
- Applied Physics lab for PLasma Engineering (APPLE), Department of Physics, Chungnam Natl Univ
- Applied Physics lab for PLasma Engineering (APPLE), Department of Physics, Chungnam National University
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The multipole resonance probe: kinetic damping in its spectra
ORAL
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Authors
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Jens Oberrath
- Institute of Product and Process Innovation, Leuphana University Lüneburg, Germany
- Leuphana University Lueneburg
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Analysis of Kinetic Dynamics of the Multipole Resonance Probe
ORAL
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Authors
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Junbo Gong
- Ruhr University Bochum
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Michael Friedrichs
- Leuphana University Lüneburg
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Sebastian Wilczek
- Ruhr University Bochum
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Denis Eremin
- Ruhr University Bochum
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Jens Oberrath
- Leuphana University Lüneburg
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Ralf Peter Brinkmann
- Ruhr University Bochum
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Kinetic Spectra of the Planar Multipole Resonance Probe
ORAL
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Authors
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Michael Friedrichs
- Institute of Product and Process Innovation, Leuphana University
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Jens Oberrath
- Institute of Product and Process Innovation, Leuphana University Lüneburg, Germany
- Leuphana University Lueneburg
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Real-time plasma impedance matching using an impedance mapping strategy.
ORAL
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Authors
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Mike Hopkins
- Impedans Ltd
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David Gahan
- Impedans Ltd
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Paul Scullin
- Impedans Ltd
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Thomas Gilmore
- Impedans Ltd
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Novel voltage-based temperature measurement method for dielectric barrier discharges
ORAL
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Authors
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Robert Bansemer
- Leibniz Institute for Plasma Science and Technology (INP)
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Ansgar Schmidt-Bleker
- Leibniz Institute for Plasma Science and Technology (INP), Greifswald, Germany
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Ursula van Rienen
- Institute of General Electrical Engineering, University of Rostock, Germany
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Klaus-Dieter Weltmann
- Leibniz Institute for Plasma Science and Technology (INP), Greifswald, Germany
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