Plasma Etching

Plasma Etching

ORAL · NR2 ·

Presentations

Optimization of Etching Recipe Using Deep Neural Network

ORAL

Nov. 8, 2018, 8:00 AM – Nov. 8, 2018, 8:15 AM
Authors
- Yutaka Okuyama
  
  Hitachi Ltd., Research Development Group
- Takeshi Ohmori
  
  Hitachi Ltd., Research Development Group
- Hyakka Nakada
  
  Hitachi Ltd., Research Development Group
- Masaru Kurihara
  
  Hitachi Ltd., Research Development Group
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Optimization of Etching Recipe Using Reinforcement Learning

ORAL

Nov. 8, 2018, 8:15 AM – Nov. 8, 2018, 8:30 AM
Authors
- Hyakka Nakada
  
  Hitachi, Ltd. Research & Development Group
- Tatehito Usui
  
  Hitachi, Ltd. Research & Development Group
- Takeshi Ohmori
  
  Hitachi, Ltd. Research & Development Group
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Optimizing Plasma Etching of High Aspect Ratio Oxide-Nitride-Oxide Stacks

ORAL

Nov. 8, 2018, 8:30 AM – Nov. 8, 2018, 8:45 AM
Authors
- Shuo Huang
  
  Univ. Michigan
- Chad Huard
  
  Univ. Michigan
- Sang Ki Nam
  
  Samsung Electronics
- Seungbo Shim
  
  Samsung Electronics
- Wonyup Ko
  
  Samsung Electronics
- Mark J. Kushner
  
  University of Michigan
  Univ. Michigan
  University of Michigan - Ann Arbor
  Univ of Michigan - Ann Arbor
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Etching of GeSe in an inductively coupled SF6 plasma

ORAL

Nov. 8, 2018, 8:45 AM – Nov. 8, 2018, 9:00 AM
Authors
- Meyer Thibaut
  
  Institut des Materiaux Jean Rouxel, Universite de Nantes, CNRS, France
- Aurelie Girard
  
  Institut des Materiaux Jean Rouxel, Universite de Nantes, CNRS, France
- Christophe Cardinaud
  
  Institut des Materiaux Jean Rouxel, Universite de Nantes, CNRS, France
- Emeline Baudet
  
  Department of Graphic Arts and Photophysics, University of Pardubice, Czech Republic
- Petr Nemec
  
  Department of Graphic Arts and Photophysics, University of Pardubice, Czech Republic
- Virginie Nazabal
  
  UMR-CNRS 6226, Sciences Chimiques de Rennes, Universite de Rennes 1, France
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Presentations

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