Evaluation of gas phase and wall surface chemical reactions in CF$_{\mathrm{4}}$ and C$_{\mathrm{4}}$F$_{\mathrm{8}}$ plasmas
POSTER
Abstract
A global model implanted with a set of gas phase and wall surface chemical reactions is used in this work for CF$_{\mathrm{4}}$ and C$_{\mathrm{4}}$F$_{\mathrm{8}}$ plasmas in an inductivity coupled plasma chamber. Firstly, by using the same set of chemical reactions, composition of radicals as well as ions is benchmarked. A study on contributions of gas phase and surface reactions to the production and consumption of species shows that surface chemistry plays a significant role in F, CF$_{\mathrm{3}}$ and CF$_{\mathrm{2\thinspace }}$radicals in CF$_{\mathrm{4}}$ and C$_{\mathrm{4}}$F$_{\mathrm{8}}$ plasmas, respectively. We also study the variation of plasma properties as a function of pressure and power at fixed gas inlet. Furthermore, in order to investigate impacts of electron energy distribution functions (EEDF) on plasma sources and sinks, both Maxwellian and non-Maxwellian EEDFs integrated with cross sections are used to evaluate the difference of chemical compositions in these plasmas.
*This work is supported by National Natural Science Foundation of China (Grant No. 11675036 and 11275038);U.S. Department of Energy;