Plasma-Surface Interactions I (Etching)

Presentations

• Surface reaction control of plasma etch for atomic level accuracy in ULSI devices fabrication

  COFFEE_KLATCH · Invited

  Nov. 6, 2018, 8:00 AM – Nov. 6, 2018, 8:30 AM

  Authors

  • Masaru Izawa

    • Hitachi High-Technologies Corp.

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• Dynamics of surface ripple formation and propagation during plasma etching

  ORAL

  Nov. 6, 2018, 8:30 AM – Nov. 6, 2018, 8:45 AM

  Authors

  • Kouichi Ono

    • Kyoto Univ

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• Plasma Parameters in an Ar and Ar/Cl$_{\mathrm{2\thinspace }}$Asymmetric Coaxial CCP Used for Plasma Etching of Superconducting Niobium Cavities.

  ORAL

  Nov. 6, 2018, 8:45 AM – Nov. 6, 2018, 9:00 AM

  Authors

  • Jeremy Peshl

    • Old Dominion University

  • Milka Nikolic

    • University of San Francisco

  • Alex Godunov

    • Old Dominion University

  • Svetozar Popovic

    • Old Dominion University

  • Lepsha Vuskovic

    • Old Dominion University

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