Gas Phase Plasma Chemistry I

Presentations

• Global model of Negative Hydrogen Ion Source.

  ORAL

  Nov. 8, 2017, 8:00 AM – Nov. 8, 2017, 8:15 AM

  Authors

  • SN Averkin

    • Tech-X Corporation

  • John Cary

    • Tech-X Corporation

  • TG Jenkins

    • Tech-X Corporation

  • SE Kruger

    • Tech-X Corporation

  • Madhusudhan Kundrapu

    • Tech-X Corporation

  • Seth Veitzer

    • Tech-X Corporation

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• Collisional radiative model for Ar/O2 plasma with reliable fine structure resolved cross sections .

  ORAL

  Nov. 8, 2017, 8:15 AM – Nov. 8, 2017, 8:30 AM

  Authors

  • Priti Priti

    • Indian Institute of Technology Roorkee, Roorkee, India

  • Reetesh Gangwar

    • Weizmann Institute of Science, Rehovot, Israel

  • Rajesh Srivastava

    • Indian Institute of Technology Roorkee, Roorkee, India

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• A zero dimensional model of microwave induced coaxial surface wave discharge fed with hexamethyldisiloxane/oxygen

  ORAL

  Nov. 8, 2017, 8:30 AM – Nov. 8, 2017, 8:45 AM

  Authors

  • Efe Kemaneci

    • Institute for Theoretical Electrical Engineering, Ruhr-University Bochum, Germany

  • Ralf Peter Brinkmann

    • Theoretische Elektrotechnik Ruhr-Universität Bochum
    • Institute for Theoretical Electrical Engineering, Ruhr-University Bochum, Germany

  • Felix Mitschker

    • Institute for Electrical Engineering and Plasma Technology, Ruhr-University Bochum, Germany

  • Peter Awakowicz

    • Institute for Electrical Engineering and Plasma Technology, Ruhr-University Bochum, Germany
    • AEPT, Ruhr University Bochum
    • Ruhr University Bochum, Germany

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• Vibrational excitation and temperature evolution in a pulsed CO2 discharge

  ORAL

  Nov. 8, 2017, 8:45 AM – Nov. 8, 2017, 9:00 AM

  Authors

  • Olivier Guaitella

    • LPP, CNRS, Ecole Polytechnique, UPMC, Université Paris-Saclay, 91128 Palaiseau, France
    • LPP, Ecole Polytechnique, UPMC, Université Paris Sud-11, CNRS - Palaiseau (France)
    • Laboratory of Plasma Physics, CNRS, Ecole Polytechnique, UPMC, Université Paris-Saclay, 91128 Palaiseau, France

  • Ana-Sofia Morillo-Candas

    • Laboratory of Plasma Physics, CNRS, Ecole Polytechnique, UPMC, Université Paris-Saclay, 91128 Palaiseau, France

  • David Yap

    • Laboratory of Plasma Physics, CNRS, Ecole Polytechnique, UPMC, Université Paris-Saclay, 91128 Palaiseau, France

  • Cyril Drag

    • Laboratory of Plasma Physics, CNRS, Ecole Polytechnique, UPMC, Université Paris-Saclay, 91128 Palaiseau, France

  • Jean-Paul Booth

    • Laboratory of Plasma Physics, CNRS, Ecole Polytechnique, UPMC, Université Paris-Saclay, 91128 Palaiseau, France

  • Bart Klarenaar

    • Department of Applied Physics, Eindhoven University of Technology, Eindhoven, The Nether- lands

  • Richard Engeln

    • Department of Applied Physics, Eindhoven University of Technology, Eindhoven, The Nether- lands

  • Marija Grofulovic

    • Instituto de Plasmas e Fuso Nuclear, Instituto Superior Tecnico, Universidade de Lisboa 1049-001 Lisboa, Portugal

  • Tiago Silva

    • Instituto de Plasmas e Fuso Nuclear, Instituto Superior Tecnico, Universidade de Lisboa 1049-001 Lisboa, Portugal

  • Vasco Guerra

    • Instituto de Plasmas e Fuso Nuclear, Instituto Superior Tecnico, Universidade de Lisboa 1049-001 Lisboa, Portugal

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• Selfconsistent Vibrational and Free Electron Kinetics in Reacting CO$_2$/CO Plasmas

  ORAL

  Nov. 8, 2017, 9:00 AM – Nov. 8, 2017, 9:15 AM

  Authors

  • Lucia Daniela Pietanza

    • Plasmi Lab CNR Nanotec Bari
    • PLASMI Lab CNR NANOTEC Bari

  • Gianpiero Colonna

    • Plasmi Lab CNR Nanotec Bari
    • PLASMI Lab CNR NANOTEC Bari

  • Mario Capitelli

    • Plasmi Lab CNR Nanotec Bari
    • PLASMI Lab CNR NANOTEC Bari

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• Reaction DB construction of Perfluorocarbons for Plasma process simulation

  ORAL

  Nov. 8, 2017, 9:15 AM – Nov. 8, 2017, 9:30 AM

  Authors

  • Satoshi Nakamura

    • ET Center, Samsung R&D Institute Japan

  • Rei Sakuma

    • ET Center, Samsung R&D Institute Japan

  • Sun-Taek Lim

    • Semiconductor R&D Center, Samsung Electronics

  • Shogo Sakurai

    • ET Center, Samsung R&D Institute Japan

  • Hiroyuki Kubotera

    • ET Center, Samsung R&D Institute Japan

  • Kiyoshi Ishikawa

    • ET Center, Samsung R&D Institute Japan

  • Keun-Ho Lee

    • Semiconductor R&D Center, Samsung Electronics

  View abstract →