Inductively Coupled Plasmas
ORAL · FT1 ·
Presentations
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Theoretical investigation of power balance and hysteresis of a miniature microwave ICP-plasmajet
ORAL
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Authors
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Michael Klute
- Institute of Theoretical Electrical Engineering, Ruhr University Bochum, Germany
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Horia-Eugen Porteanu
- Microwave Department, Ferdinand-Braun-Institut, Germany
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Wolfgang Heinrich
- Microwave Department, Ferdinand-Braun-Institut, Germany
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Peter Awakowicz
- Electrical Engineering and Plasma Technology, Ruhr University Bochum, Germany
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Ralf Peter Brinkmann
- Institute of Theoretical Electrical Engineering, Ruhr University Bochum, Germany
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Experimental Investigation of pulsed inductively coupled Ar and Ar/N2 plasmas by a time-resolved Langmuir probe
ORAL
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Authors
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Fei Gao
- Dalian University of Technology,China
- Dalian University of Technology
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Yu-Ru Zhang
- Dalian University of Technology
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Yong-Xin Liu
- Dalian University of Technology
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You-Nian Wang
- Dalian University of Technology
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Fundamental Studies of Pulsed Processing Plasmas
ORAL
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Authors
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Kristopher Ford
- North Carolina State University
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Joel Brandon
- North Carolina State University
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Kyung Sun Kim
- Samsung Electronics Co.
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Tyler List
- University of Houston
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Tianyu Ma
- University of Houston
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Priyanka Arora
- University of Houston
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Shuo Huang
- University of Michigan
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Sang Ki Nam
- Samsung Electronics Co.
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Steven Shannon
- North Carolina State University
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Vincent Donnelly
- University of Houston
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Mark Kushner
- University of Michigan
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Model Describing The E-H Mode Transition With Intrinsic Electrical Properties Of Inductively Coupled Plasma Reactors
ORAL
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Authors
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Shaun Smith
- MKS Instruments, Inc.
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David J. Coumou
- MKS Instruments, Inc.
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E-H mode detection and symmetry effects in ICP plasmas with bias power
ORAL
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Authors
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Michael Klick
- Plasmetrex GmbH
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Effects of electron energy probability function on the negative ion production in low pressure inductively coupled hydrogen plasmas.
ORAL
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Authors
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Wei Yang
- Dalian University of Technology,China and Princeton Plasma Phys Lab
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Hong Li
- Dalian University of Technology,China
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Fei Gao
- Dalian University of Technology,China
- Dalian University of Technology
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Alexander Khrabrov
- Princeton Plasma Physics Lab
- Princeton Plasma Phys Lab
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Igor Kaganovich
- Princeton Plasma Physics Laboratory, Princeton, NJ
- Princeton Plasma Physics Lab
- Princeton Plasma Physics Laboratory
- Princeton Plasma Phys Lab
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You-Nian Wang
- School of Physics and Optoelectronic Technology, Dalian University of Technology, China
- Dalian University of Technology
- School of Physics, Dalian University of Technology, Dalian
- Dalian University of Technology,China
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Circuit induced pulsed RF transients: impact on plasma parameters and source design considerations
ORAL
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Authors
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Joel Brandon
- North Carolina State University
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Kris Ford
- North Carolina State University
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Sang-Ki Nam
- Samsung Electronics
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Jang-Gyoo Yang
- Samsung Electronics
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Sangheon Lee
- Samsung Electronics
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Steve Shannon
- North Carolina State University
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A novel linear microwave plasma source using circular TE$_{\mathrm{11}}$ mode and continuous line slot antenna
ORAL
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Authors
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Ju-Hong Cha
- Department of Electrical Engineering, Pusan National University, Busan, South Korea
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Ho-Jun Lee
- Electrical and Computer engineering, Pusan National University
- Department of Electrical Engineering, Pusan National University, Busan, South Korea
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