Practical Challenges for Industry

Presentations

• Use of plasma sensors combined with artificial intelligence in the diagnostics and monitoring of plasma processes.

  ORAL

  Nov. 6, 2017, 2:00 PM – Nov. 6, 2017, 2:30 PM

  Authors

  • Michael Hopkins

    • Impedans Ltd.

  • Cliodhna Harrison

    • Impedans Ltd.

  • Paul Scullin

    • Impedans Ltd.

  • David Gahan

    • Impedans Ltd.

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• The significance of RF power delivery for thin-film semiconductor plasma processes and the enhancements of innovative solutions

  ORAL

  Nov. 6, 2017, 2:30 PM – Nov. 6, 2017, 3:00 PM

  Authors

  • David J. Coumou

    • MKS Instruments, Inc.

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• Plasma etch reactor design challenges for high RF power applications

  ORAL

  Nov. 6, 2017, 3:00 PM – Nov. 6, 2017, 3:30 PM

  Authors

  • Alexei Marakhtanov

    • Lam Research Corporation

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• Atomic Layer Processing of Silicon Dielectrics: Precursors, Processes, and Plasmas

  ORAL

  Nov. 6, 2017, 3:30 PM – Nov. 6, 2017, 4:00 PM

  Authors

  • David C. Smith

    • Lam Research Corporation

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• Advanced HIPIMS solution for R&D and Process Development

  ORAL

  Nov. 6, 2017, 4:00 PM – Nov. 6, 2017, 4:30 PM

  Authors

  • Sean Armstrong

    • Kurt J. Lesker Company

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• Practical challenges for the integration and application of plasmas in atomic layer deposition systems

  ORAL

  Nov. 6, 2017, 4:30 PM – Nov. 6, 2017, 5:00 PM

  Authors

  • Sean Armstrong

    • Kurt J. Lesker Company

  View abstract →