Plasma Deposition II
ORAL · RR2 ·
Presentations
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Selective deposition for "chamber clean-free" processes using tailored voltage waveform plasmas
ORAL
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Authors
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Junkang Wang
- LPICM, CNRS, École Polytechnique, Université Paris Saclay
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E. V. Johnson
- LPICM, CNRS, École Polytechnique, Université Paris Saclay
- LPICM, CNRS, Ecole Polytechnique, Universite Paris-Saclay
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Thin film deposition using rarefied gas jet
ORAL
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Authors
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Dr. Sahadev Pradhan
- Dept. of Chemical Engineering, Indian Institute of Science, Bangalore-560 012, India
- Dept of Chemical Engineering, Indian Institute of Science, Bangalore-560 012, India
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Effects of Various RF Powers on CdTe Thin Film Growth Using RF Magnetron Sputtering
ORAL
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Authors
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Mohammad Alibakhshi
- Department of Physics, Azad University, Tehran, Iran
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Zohreh Ghorannevis
- Department of Physics, Azad University, Iran
- Department of Physics, Azad University, Tehran, Iran
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Plasma Assisted Growth of MoNi Thin Films and Its Physical Characterization
ORAL
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Authors
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Zohreh Ghorannevis
- Department of Physics, Azad University, Iran
- Department of Physics, Azad University, Tehran, Iran
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Elaheh Akbarnejad
- Department of Physics, Azad University, Iran
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Mahmood Ghoranneviss
- Department of Physics, Azad University, Iran
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Atmospheric inductively coupled Ar/H$_{\mathrm{2}}$ plasma torch for spraying B$_{\mathrm{4}}$C/Cu functionally gradient material
ORAL
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Authors
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Peng Zhao
- Institute of Plasma Physics, Chinese Academy of Sciences, PO Box 1126, Hefei 230031, China
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Lin Li
- Institute of Plasma Physics, Chinese Academy of Sciences, PO Box 1126, Hefei 230031, China
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Qijia Guo
- Institute of Plasma Physics, Chinese Academy of Sciences, PO Box 1126, Hefei 230031, China
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Guohua Ni
- Institute of Plasma Physics, Chinese Academy of Sciences, PO Box 1126, Hefei 230031, China
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Xiaodong Zhang
- Institute of Plasma Physics, Chinese Academy of Sciences, PO Box 1126, Hefei 230031, China
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Modelling the plasma plume of an assist source in PIAD
ORAL
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Authors
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Jochen Wauer
- Leibniz Institute for Plasma Science and Technology
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Jens Harhausen
- Leibniz Institute for Plasma Science and Technology
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R\"udiger Foest
- Leibniz Institute for Plasma Science and Technology
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D. Loffhagen
- Leibniz Institute for Plasma Science and Technology
- Leibniz Institute for Plasma Science and Technology, Germany
- INP Greifswald, Felix-Hausdorff-Str. 2, 17489 Greifswald, Germany
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