Plasma Surface Interaction

Presentations

• Hybrid molecular dynamics simulation for plasma induced damage analysis

  COFFEE_KLATCH · Invited

  Oct. 13, 2016, 8:30 AM – Oct. 13, 2016, 9:00 AM

  Authors

  • Masaaki Matsukuma

    • Tokyo Electron Limited
    • Tokyo Electron Ltd.

  View abstract →

• Plasma Simulation in the Multiphysics Object Oriented Simulation Environment MOOSE.

  ORAL

  Oct. 13, 2016, 9:00 AM – Oct. 13, 2016, 9:15 AM

  Authors

  • Steven Shannon

    • North Carolina State Univ

  • Alex Lindsay

    • University of Illinois

  • David Graves

    • University of California - Berkeley

  • Casey Icenhour

    • North Carolina State Univ

  • David Peterson

    • North Carolina State Univ

  • scott White

    • MKS Instruments RF Power Division

  View abstract →

• Electron Emission from Nano and MicroStructured Materials for Plasma Applications

  ORAL

  Oct. 13, 2016, 9:15 AM – Oct. 13, 2016, 9:30 AM

  Authors

  • Marlene Patino

    • University of California, Los Angeles

  • Yevgeny Raitses

    • Princeton Plasma Phys Lab
    • Princeton Plasma Physics Laboratory
    • Princeton Plasma Physics Laboratory, USA
    • Princeton Plasma Physics Lab

  • Richard Wirz

    • University of California, Los Angeles

  View abstract →

• Effects of Gas and Surface Temperatures during Cryogenic Etching of silicon with SF$_{\mathrm{6}}$/O$_{\mathrm{2}}$

  ORAL

  Oct. 13, 2016, 9:30 AM – Oct. 13, 2016, 9:45 AM

  Authors

  • Stefan Tinck

    • University of Antwerp

  • Erik Neyts

    • University of Antwerp

  • Thomas Tillocher

    • Universite d'Orleans

  • Remi Dussart

    • Universite d'Orleans

  • Annemie Bogaerts

    • University of Antwerp

  View abstract →

• Spectral Emission of fast non-Maxwellian Atoms at metallic Surfaces in low density Plasmas

  ORAL

  Oct. 13, 2016, 9:45 AM – Oct. 13, 2016, 10:00 AM

  Authors

  • Sven Dickheuer

    • Forschungszentrum Juelich GmbH, IEK-4 Plasmaphysik, Trilateral Euregio Cluster (TEC), 52425 Juelich

  • Oleksandr Marchuk

    • Forschungszentrum Juelich GmbH, IEK-4 Plasmaphysik, Trilateral Euregio Cluster (TEC), 52425 Juelich

  • Christian Brandt

    • Max-Planck-Institut fuer Plasmaphysik, 17491 Greifswald, Germany

  • Albrecht Pospieszczyk

    • Forschungszentrum Juelich GmbH, IEK-4 Plasmaphysik, Trilateral Euregio Cluster (TEC), 52425 Juelich

  View abstract →

• Atomic Precision Plasma Processing -- Modeling Investigations

  COFFEE_KLATCH · Invited

  Oct. 13, 2016, 10:00 AM – Oct. 13, 2016, 10:30 AM

  Authors

  • Shahid Rauf

    • Applied Materials, Inc., Santa Clara, California, USA

  View abstract →