Plasma Etching

Presentations

• Layer by layer etching of LaAlSiO$_{\mathrm{x}}$

  COFFEE_KLATCH · Invited

  Oct. 12, 2016, 3:00 PM – Oct. 12, 2016, 3:30 PM

  Authors

  • Hisataka Hayashi

    • Toshiba corporation

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• Variation in photon-induced interface defects due to transient behavior of pulse modulated inductively coupled plasma

  ORAL

  Oct. 12, 2016, 3:30 PM – Oct. 12, 2016, 3:45 PM

  Authors

  • Y. Miyoshi

    • Sony Semiconductor Solutions Corp.

  • M. Fukasawa

    • Sony Semiconductor Solutions Corp.

  • K. Nagahata

    • Sony Semiconductor Solutions Corp.

  • T. Tatsumi

    • Sony Semiconductor Solutions Corp.

  • Z. Liu

    • Nagoya Univ.

  • Y. Zhang

    • Nagoya Univ.

  • A. Ando

    • Nagoya Univ.

  • K. Takeda

    • Nagoya Univ.

  • K. Ishikawa

    • Nagoya Univ.

  • M. Sekine

    • Nagoya Univ.

  • M. Hori

    • Nagoya Univ.

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• Computer modelling of cryogenic etching in SF6/O2/SiF4 and CxFy inductively coupled plasmas

  ORAL

  Oct. 12, 2016, 3:45 PM – Oct. 12, 2016, 4:00 PM

  Authors

  • Quan-Zhi Zhang

    • University of Antwerp

  • Annemie Bogaerts

    • Antwerp University
    • University of Antwerp, Plasmant
    • Plasmant, University of Antwerp
    • University of Antwerp
    • Department of Chemistry, Research group PLASMANT, University of Antwerp
    • PLASMANT University of Antwerp

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• Temporal evolution of as-developed line and space photoresist profiles during etch.

  ORAL

  Oct. 12, 2016, 4:00 PM – Oct. 12, 2016, 4:15 PM

  Authors

  • Barton Lane

    • Tokyo Electron America
    • Tokyo Electron Ltd.

  • Peter Ventzek

    • Tokyo Electron America

  • Alok Ranjan

    • TEL Technology Center, America, LLC

  • Vinayak Rastogi

    • TEL Technology Center, America, LLC

  • Jun Yoshikawa

    • Tokyo Electron Miyagi, LLC

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• Origin of plasma-induced surface roughening and ripple formation during plasma etching

  ORAL

  Oct. 12, 2016, 4:15 PM – Oct. 12, 2016, 4:30 PM

  Authors

  • Kouichi Ono

    • Kyoto University

  • Nobuya Nakazaki

    • Kyoto University

  • Hirotaka Tsuda

    • Kyoto University

  • Yoshinori Takao

    • Yokohama National University
    • Kyoto University
    • Yokohama National Univ

  • Koji Eriguchi

    • Kyoto University

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• Tailored Voltage Waveforms in an SF6/O2 discharge: slope asymmetry and its effect on surface nanotexturing of silicon

  ORAL

  Oct. 12, 2016, 4:30 PM – Oct. 12, 2016, 4:45 PM

  Authors

  • G. Fischer

    • Institut Photovoltaique d'Ile-de-France

  • E. Drahi

    • Total MS-Energie Nouvelles

  • G. Poulain

    • Total MS-Energie Nouvelles

  • B. Bruneau

    • LPICM, CNRS, Ecole Polytechnique, Universite Paris-Saclay

  • E. V. Johnson

    • LPICM, CNRS, École Polytechnique, Université Paris Saclay
    • LPICM, CNRS, Ecole Polytechnique, Universite Paris-Saclay

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• WITHDRAWN ABSTRACT

  Oct. 12, 2016, 4:45 PM – Oct. 12, 2016, 5:00 PM

  View abstract →