Capacitively Coupled Plasmas II
FOCUS · JW2 ·
Presentations
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Experimental and simulation study of capacitively coupled electronegative discharges
COFFEE_KLATCH · Invited
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Authors
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Aranka Derzsi
- Wigner Research Centre for Physics, Budapest, Hungary
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Plasma Self-organization in Moderately High Pressure Capacitively Coupled RF Discharge.
ORAL
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Authors
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Anton Kobelev
- Applied Materials, Inc., Global Development Center, Russia
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Kallol Bera
- Applied Materials, Inc.
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John Forster
- Applied Materials, Inc.
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Alexander Smirnov
- Applied Materials, Inc., Global Development Center, Russia
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Comparison of different methods for the measurements and calculations of Capacitively Coupled Plasmas electrical characteristics
ORAL
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Authors
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Giannis Tsigaras
- Plasma Technology Laboratory - Department of Chemical Engineering - University of Patras
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Nikolaos Spiliopoulos
- Department of Physics - University of Patras
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Eleftherios Amanatides
- Plasma Technology Laboratory - Department of Chemical Engineering - University of Patras
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Dimitrios Mataras
- Plasma Technology Laboratory - Department of Chemical Engineering - University of Patras
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Fluid Modeling of a Very High Frequency Capacitively Coupled Reactor
ORAL
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Authors
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Rochan Upadhyay
- Esgee Technologies Inc.
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Laxminarayan Raja
- The University of Texas at Austin
- University of Texas at Austin
- University of Texas
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Peter Ventzek
- Tokyo Electron America, Austin, Texas 78741, USA
- Tokyo Electron America
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Toshihiko Iwao
- Tokyo Electron Ltd.
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Kiyotaka Ishibashi
- Tokyo Electron Ltd.
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Consistent kinetic simulation of plasma and sputtering in low temperature plasmas
ORAL
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Authors
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Frederik Schmidt
- Institute of Theoretical Electrical Engineering, Ruhr University Bochum
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Jan Trieschmann
- Institute of Theoretical Electrical Engineering, Ruhr University Bochum
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Thomas Mussenbrock
- Institute of Theoretical Electrical Engineering, Ruhr University Bochum
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