Plasma Etching I
FOCUS · OR2 ·
Presentations
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In-Plasma Photo-Assisted Etching
COFFEE_KLATCH · Invited
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Authors
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Demetre Economou
- University of Houston
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Advanced Simulation Technology to Design Etching Process on CMOS Devices
COFFEE_KLATCH · Invited
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Authors
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Nobuyuki Kuboi
- Sony Corporation
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Conceptual Design of Electron-Beam Generated Plasma Tools
ORAL
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Authors
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Ankur Agarwal
- Applied Materials Inc.
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Shahid Rauf
- Applied Materials Inc.
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Leonid Dorf
- Applied Materials Inc.
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Ken Collins
- Applied Materials Inc.
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David Boris
- Plasma Physics Division, Naval Research Laboratory
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Scott Walton
- Plasma Physics Division, Naval Research Laboratory
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Surface rippling by oblique ion incidence during plasma etching of silicon: Experimental demonstration using sheath control plates
ORAL
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Authors
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Nobuya Nakazaki
- Department of Aeronautics and Astronautics, Graduate School of Engineering, Kyoto University
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Haruka Matsumoto
- Department of Aeronautics and Astronautics, Graduate School of Engineering, Kyoto University
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Koji Eriguchi
- Department of Aeronautics and Astronautics, Graduate School of Engineering, Kyoto University
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Kouichi Ono
- Department of Aeronautics and Astronautics, Graduate School of Engineering, Kyoto University
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Apparatus and Method to Plasma Etch Inner Surface of the Varied Diameter Cylindrical Structure
ORAL
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Authors
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Janardan Upadhyay
- Old Dominion University
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Do Im
- Old Dominion University
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J. Peshl
- Old Dominion University
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S. Popovic
- Old Dominion University
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Anne-Marie Valente-Feliciano
- Thomas Jefferson National Accelerator Facility
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L. Phillips
- Thomas Jefferson National Accelerator Facility
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L. Vuskovic
- Old Dominion University
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Photoluminescence of GaN Film Exposed to Chlorine-Containing Plasma
ORAL
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Authors
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Daisuke Ogawa
- Chubu University
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Yoshitsugu Banno
- Chubu University
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Yoshitaka Nakano
- Chubu University
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Keiji Nakamura
- Chubu University
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