Plasma CVD/Radical Assisted CVD

Presentations

• Spectroscopic studies of MW plasmas containing HMDSO, O$_{2}$ and N$_{2}$

  ORAL

  Oct. 15, 2015, 8:00 AM – Oct. 15, 2015, 8:15 AM

  Authors

  • Andy Nave

    • INP-Greifswald, Germany

  • Juergen Roepcke

    • INP-Greifswald, Germany

  • Felix Mitschker

    • Ruhr University Bochum, Germany

  • Peter Awakowicz

    • Ruhr University Bochum, Germany

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• Study of O$_{3}$-TEOS SiO$_{2}$ Cladding for Silicon Photonics Devices

  ORAL

  Oct. 15, 2015, 8:15 AM – Oct. 15, 2015, 8:30 AM

  Authors

  • Keizo Kinoshita

    • PETRA

  • Tsuyoshi Horikawa

    • PETRA, AIST

  • Daisuke Shimura

    • PETRA

  • Hiroyuki Takahashi

    • PETRA

  • Tohru Mogami

    • PETRA

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• Low temperature synthesis of silicon nitride thin films deposited by VHF/RF PECVD for gas barrier application

  ORAL

  Oct. 15, 2015, 8:30 AM – Oct. 15, 2015, 8:45 AM

  Authors

  • J.S. Lee

    • NU-SKKU Joint Institute for Plasma Nano Materials (IPNM), Center for Advanced Plasma Surface Technology (CAPST) and Sungkyunkwan University
    • NU-SKKU Joint Institute for Plasma Nano Materials, Center for Advanced Plasma Surface Technology, Sungkyunkwan University, Korea

  • Kyung S. Shin

    • NU-SKKU Joint Institute for Plasma Nano Materials (IPNM), Center for Advanced Plasma Surface Technology (CAPST) and Sungkyunkwan University

  • B.B. Sahu

    • NU-SKKU Joint Institute for Plasma Nano Materials (IPNM), Center for Advanced Plasma Surface Technology (CAPST) and Sungkyunkwan University

  • Jeon G. Han

    • NU-SKKU Joint Institute for Plasma Nano Materials (IPNM), Center for Advanced Plasma Surface Technology (CAPST) and Sungkyunkwan University

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• Development of high-density radical source and its application to high-speed growth of nitride semiconductors by plasma-assisted molecular beam epitaxy

  ORAL

  Oct. 15, 2015, 8:45 AM – Oct. 15, 2015, 9:00 AM

  Authors

  • Hiroki Kondo

    • Nagoya University

  • Yukinori Kiheida

    • NU EcoEngineering Co. Ltd.

  • Hiroyuki Kano

    • NU EcoEngineering Co. Ltd.

  • Yvon Cordier

    • CNRS-CRHEA

  • Phannara Aing

    • Riber Co.

  • Olivier Grange

    • Riber Co.

  • Yuri Tsutsumi

    • Nagoya University

  • Osamu Oda

    • Nagoya University

  • Masaru Hori

    • Nagoya University

  • Hiroshi Amano

    • Nagoya University

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• Reactive radical production and transport analysis in ammonia-hydrogen-argon microwave plasmas

  ORAL

  Oct. 15, 2015, 9:00 AM – Oct. 15, 2015, 9:15 AM

  Authors

  • Toshihiko Iwao

    • Tokyo Electron Limited
    • Tokyo Electron, Inc.

  • Peter Ventzek

    • Tokyo Electron America

  • Rochan Upadhyay

    • Esgee Technologies Inc.

  • Laxminarayan Raja

    • University of Texas Austin

  • Kiyotaka Ishibashi

    • Tokyo Electron Limited

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• Plasma CVD synthesis of new diamond-bismuth thin films by solid-source immersion

  ORAL

  Oct. 15, 2015, 9:15 AM – Oct. 15, 2015, 9:30 AM

  Authors

  • Takahiro Tamura

    • Faculty of Engineering, Hokkaido University

  View abstract →