Application of Atmospheric-Pressure Microwave Line Plasma for Low Temperature Process

Atmospheric pressure (AP) plasmas have been given much attention because of its high cost benefit and a variety of possibilities for industrial applications. In various kinds of plasma production technique, pulsed-microwave discharge plasma using slot antenna is attractive due to its ability of high-density and stable plasma production. In this plasma source, however, size of the plasma has been limited up to a few cm in length due to standing wave inside a waveguide. To solve this, we have proposed a newly-developed AP microwave plasma source that utilizes not standing wave but travelling wave. By using this plasma source, spatially-uniform AP line plasma with 40 cm in length was realized by pure helium discharge in 60 cm slot and with nitrogen gas additive of 1{\%}. Furthermore, gas temperature as low as 400 K was realized in this device. In this study, as an example of low temperature processes, hydrophilic treatment of PET films was performed. Processing speed increased with pulse frequency and a water contact angle of $\sim$ 20$^{\circ}$ was easily obtained within 5 s with no thermal damage to the substrate. To evaluate treatment-uniformity of long line length, PET films were treated by 90 cm slot-antenna plasma and uniform treatment performance was confirmed.