Ion Assisted Deposition

Presentations

• Superhard Coatings Synthesis Assisted by Pulsed Beams of High-Energy Gas Molecules

  ORAL

  Oct. 14, 2015, 8:00 AM – Oct. 14, 2015, 8:15 AM

  Authors

  • Alexander Metel

    • Moscow State University of Technology ``STANKIN''

  • Vasily Bolbukov

    • Moscow State University of Technology ``STANKIN''

  • Marina Volosova

    • Moscow State University of Technology ``STANKIN''

  • Sergei Grigoriev

    • Moscow State University of Technology ``STANKIN''

  • Yury Melnik

    • Moscow State University of Technology ``STANKIN''

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• Effects of ion bombardments on electronic properties of amorphous carbon films grown by plasma-enhanced chemical vapor deposition

  ORAL

  Oct. 14, 2015, 8:15 AM – Oct. 14, 2015, 8:30 AM

  Authors

  • Hirotsugu Sugiura

    • Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan

  • Lingyun Jia

    • Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan

  • Hiroki Kondo

    • Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan

  • Kenji Ishikawa

    • Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan

  • Keigo Takeda

    • Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan

  • Makoto Sekine

    • Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan

  • Masaru Hori

    • Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan

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• In-situ monitoring of plasma ion assisted deposition (PIAD) processes

  ORAL

  Oct. 14, 2015, 8:30 AM – Oct. 14, 2015, 8:45 AM

  Authors

  • Jens Harhausen

    • Leibniz Institute for Plasma Science and Technology, Felix-Hausdorff-Stra\ss e 2, 17489 Greifswald, Germany

  • R\"udiger Foest

    • Leibniz Institute for Plasma Science and Technology, Felix-Hausdorff-Stra\ss e 2, 17489 Greifswald, Germany

  • Detlef Loffhagen

    • Leibniz Institute for Plasma Science and Technology, Felix-Hausdorff-Stra\ss e 2, 17489 Greifswald, Germany

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• ICP-Enhanced Sputter Deposition for Reactivity Control and Low-Temperature Formation of a-IGZO Films

  ORAL

  Oct. 14, 2015, 8:45 AM – Oct. 14, 2015, 9:00 AM

  Authors

  • Yuichi Setsuhara

    • Osaka University

  • Keitaro Nakata

    • Osaka University

  • Yoshikatsu Satake

    • Osaka University

  • Kosuke Takenaka

    • Osaka University

  • Giichiro Uchida

    • Osaka University

  • Akinori Ebe

    • EMD Corporation

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• Plasma deposition of amorphous silicon carbide thin films irradiated with neutrons

  ORAL

  Oct. 14, 2015, 9:00 AM – Oct. 14, 2015, 9:15 AM

  Authors

  • J. Huran

    • IEE SAS, Bratislava, Slovakia

  • P. Bohacek

    • IEE SAS, Bratislava, Slovakia

  • M. Kucera

    • IEE SAS, Bratislava, Slovakia

  • A. Kleinova

    • Polymer Institute, SAS, Bratislava, Slovakia

  • V. Sasinkova

    • Institute of Chemistry, SAS, Bratislava, Slovakia

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• Feature Scale Simulations of Deposition Processes

  ORAL

  Oct. 14, 2015, 9:15 AM – Oct. 14, 2015, 9:30 AM

  Authors

  • Paul Moroz

    • Tokyo Electron U.S. Holdings, Inc.

  • Daniel J. Moroz

    • University of Pennsylvania

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