Primary dissociation channels of SiH4

POSTER

Abstract

The primary dissociation channels of SiH4 were investigated using computational chemistry. The results showed the very similar properties to those of CH4. The main dissociation product was SiH2 and the second dissociation product was SiH3. SiH was produced through SiH3 to SiH$+$H2 reaction, by electronic excitation.

Authors

  • Toshio Hayashi

    • Nagoya Univ
    • Nagoya University

  • Kenji Ishikawa

    • Nagoya Univ
    • Graduate School of Engineering, Nagoya Univ.
    • Nagoya University

  • Makoto Sekine

    • Nagoya Univ
    • Nagoya University

  • Masaru Hori

    • Plama Nanotechnology Research Center, Nagoya University, Nagoya, Japan
    • Nagoya Univ
    • Graduate School of Engineering, Nagoya Univ.
    • Nagoya University