Plasma Surface Interactions I

Presentations

• Negative-permittivity plasma generation in negative-permeability metamaterial space

  COFFEE_KLATCH · Invited

  Oct. 13, 2015, 8:00 AM – Oct. 13, 2015, 8:30 AM

  Authors

  • Osamu Sakai

    • University of Shiga Prefecture
    • The University of Shiga Prefecture

  View abstract →

• Numerical modeling of plasma meta-materials for electromagnetic energy flow control

  ORAL

  Oct. 13, 2015, 8:30 AM – Oct. 13, 2015, 8:45 AM

  Authors

  • Konstantinos Kourtzanidis

    • The University of Texas at Austin

  • Dylan Pederson

    • The University of Texas at Austin

  • Laxminarayan Raja

    • University of Texas at Austin
    • Department of Aerospace Engineering and Engineering Mechanics, The University of Texas at Austin
    • The University of Texas at Austin
    • University of Texas, Austin

  View abstract →

• Carrier transport and trapping in a-Si:H films under plasma processing

  ORAL

  Oct. 13, 2015, 8:45 AM – Oct. 13, 2015, 9:00 AM

  Authors

  • Shota Nunomura

    • National Institute of Advanced Industrial Science and Technology

  • Isao Sakata

    • National Institute of Advanced Industrial Science and Technology

  • Koji Matsubara

    • National Institute of Advanced Industrial Science and Technology

  View abstract →

• Damage formation mechanisms of Si and Ge substrates by ion bombardment

  ORAL

  Oct. 13, 2015, 9:00 AM – Oct. 13, 2015, 9:15 AM

  Authors

  • Masaaki Matsukuma

    • TEL Technology Development Center, Yamanashi
    • Tokyo Electron Limited

  • Tamotsu Morimoto

    • Tokyo Electron Limited

  • Michiro Isobe

    • Osaka University

  • Kazuhiro Karahashi

    • Osaka University

  • Satoshi Hamaguchi

    • Osaka University

  View abstract →

• Mechanisms of Hydrocarbon Based Polymer Etch

  ORAL

  Oct. 13, 2015, 9:15 AM – Oct. 13, 2015, 9:30 AM

  Authors

  • Barton Lane

    • Tokyo Electron America

  • Peter Ventzek

    • Tokyo Electron America

  • Masaaki Matsukuma

    • TEL Technology Development Center, Yamanashi
    • Tokyo Electron Limited

  • Ayuta Suzuki

    • TEL Technology Development Center, Yamanashi

  • Akira Koshiishi

    • TEL Process Module Technology Department, Miyagi

  View abstract →

• The Effect of N2 Plasma on Atomic Hydrogen Surface Recombination

  ORAL

  Oct. 13, 2015, 9:30 AM – Oct. 13, 2015, 9:45 AM

  Authors

  • S. Smith

    • MKS Instruments

  • C.Y. Tai

    • MKS Instruments

  View abstract →