Modeling of Plasma Etching

Presentations

• Profile Control Using Pulsed Power During Plasma Etching in Capacitively Coupled Plasmas

  ORAL

  Nov. 4, 2014, 1:30 PM – Nov. 4, 2014, 1:45 PM

  Authors

  • Sang-Heon Song

    • University of Michigan

  • Mark J. Kushner

    • University of Michigan

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• Insights into Plasma Etch Profile Evolution with 3D Profile Simulation

  ORAL

  Nov. 4, 2014, 1:45 PM – Nov. 4, 2014, 2:00 PM

  Authors

  • Saravanapriyan Sriraman

    • Lam Research

  • Alex Paterson

    • Lam Research

  • Yiting Zhang

    • University of Michigan

  • Mark J. Kushner

    • University of Michigan

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• Multi Time-Step Feature Scale Simulations with FPS3D

  ORAL

  Nov. 4, 2014, 2:00 PM – Nov. 4, 2014, 2:15 PM

  Authors

  • Paul Moroz

    • Tokyo Electron U.S. Holdings, Inc.

  • Daniel Moroz

    • University of Pennsylvania

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• Modeling of plasma-induced damage during the etching of ultimately-scaled transistors in ULSI circuits---A model prediction of damage in three dimensional structures

  COFFEE_KLATCH · Invited

  Nov. 4, 2014, 2:15 PM – Nov. 4, 2014, 2:45 PM

  Authors

  • Koji Eriguchi

    • Kyoto University

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• Molecular dynamics analysis of silicon chloride ion incidence during Si etching in Cl-based plasmas: Effects of ion incident energy, angle, and neutral radical-to-ion flux ratio

  ORAL

  Nov. 4, 2014, 2:45 PM – Nov. 4, 2014, 3:00 PM

  Authors

  • Nobuya Nakazaki

    • Kyoto University

  • Koji Eriguchi

    • Kyoto University

  • Kouichi Ono

    • Kyoto University

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