Plasma Deposition

Presentations

• Novel plasma catalytic reaction for structural-controlled growth of graphene and graphene nanoribbon

  COFFEE_KLATCH · Invited

  Oct. 4, 2013, 8:30 AM – Oct. 4, 2013, 9:00 AM

  Authors

  • Toshiaki Kato

    • Department of Electronic Engineering, Tohoku University

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• A Source of Metal Vapor and Pulsed Beams of High-Energy Gas Molecules

  ORAL

  Oct. 4, 2013, 9:00 AM – Oct. 4, 2013, 9:15 AM

  Authors

  • Alexander Metel

    • Moscow State University of Technology ``STANKIN''

  • Vasily Bolbukov

    • Moscow State University of Technology ``STANKIN''

  • Marina Volosova

    • Moscow State University of Technology ``STANKIN''

  • Sergei Grigoriev

    • Moscow State University of Technology ``STANKIN''

  • Yury Melnik

    • Moscow State University of Technology ``STANKIN''

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• Diagnostics and Monitoring of a Plasma Beam Source based on Optical Emission Spectroscopy

  ORAL

  Oct. 4, 2013, 9:15 AM – Oct. 4, 2013, 9:30 AM

  Authors

  • Jens Harhausen

    • Leibniz Institute for Plasma Science and Technology

  • R\"udiger Foest

    • Leibniz Institute for Plasma Science and Technology

  • Detlef Loffhagen

    • Leibniz Institute for Plasma Science and Technology

  • Andreas Ohl

    • Leibniz Institute for Plasma Science and Technology

  • Jan Sch\"afer

    • Leibniz Institute for Plasma Science and Technology

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• Plasma chemistry and scaling parameter in high-current dielectric barrier discharges used for plasma-enhanced CVD of SiO$_{2}$ on polymers

  ORAL

  Oct. 4, 2013, 9:30 AM – Oct. 4, 2013, 9:45 AM

  Authors

  • F. Brehmer

    • Eindhoven University of Technology, Eindhoven, The Netherlands

  • S. Welzel

    • Eindhoven University of Technology, Eindhoven, The Netherlands

  • S.A. Starostin

    • FUJIFILM Manufacturing Europe B.V., Tilburg, The Netherlands

  • H. de Vries

    • FUJIFILM Manufacturing Europe B.V., Tilburg, The Netherlands

  • M.C.M. van de Sanden

    • Dutch Institute for Fundamental Energy Research, Nieuwegein, The Netherlands

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• Atmospheric inductively coupled Ar/H$_{2}$ plasmas jet for low-temperature deposition of Cu Thin Film on Polyimide

  ORAL

  Oct. 4, 2013, 9:45 AM – Oct. 4, 2013, 10:00 AM

  Authors

  • Peng Zhao

    • Shizuoka University

  • Wei Zheng

    • Research and Technology Center, Yazaki Corp.

  • Yuedong Meng

    • Institute of Plasma Physics, Chinese Academy of Sciences

  • Masaaki Nagatsu

    • Shizuoka University

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