Plasma-surface Interactions

Presentations

• Simulating the Spontaneous Formation of Self-Organized Anode Spot Patterns in Arc Discharges

  ORAL

  Oct. 3, 2013, 10:00 AM – Oct. 3, 2013, 10:15 AM

  Authors

  • Juan Trelles

    • University of Massachusetts Lowell

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• Effects of Asymmetric Secondary Emission on Plasma Properties of ExB Discharges

  ORAL

  Oct. 3, 2013, 10:15 AM – Oct. 3, 2013, 10:30 AM

  Authors

  • Hongyue Wang

    • Beihang University
    • Beihang University; Princeton Plasma Physics Laboratory

  • Michael Campanell

    • Princeton Plasma Physics Laboratory

  • Igor Kaganovich

    • Princeton Plasma Physics Laboratory

  • Alexander Khrabrov

    • Princeton Plasma Physics Laboratory

  • Yevgeny Raitses

    • Princeton Plasma Physics Laboratory

  • Dmytro Sydorenko

    • University of Alberta

  • Guobiao Cai

    • Beihang University

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• Molecular dynamics simulation of plasma-induced Si substrate damage: Latent defect structures and bias-frequency effects

  ORAL

  Oct. 3, 2013, 10:30 AM – Oct. 3, 2013, 10:45 AM

  Authors

  • Koji Eriguchi

    • Kyoto University

  • Asahiko Matsuda

    • Kyoto University

  • Yoshinori Takao

    • Kyoto University

  • Kouichi Ono

    • Kyoto University

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• Secondary electron emission yield dependence on the Fermi level in Silicon

  ORAL

  Oct. 3, 2013, 10:45 AM – Oct. 3, 2013, 11:00 AM

  Authors

  • David Urrabazo

    • University of Texas at Dallas

  • Matthew Goeckner

    • University of Texas at Dallas
    • The University of Texas at Dallas

  • Lawrence Overzet

    • The University of Texas at Dallas
    • University of Texas at Dallas

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• Experimental Evidence of Change in Sheath Properties due to Secondary Electron Emission in a Crossed Field Plasma Setup

  ORAL

  Oct. 3, 2013, 11:00 AM – Oct. 3, 2013, 11:15 AM

  Authors

  • Kapil U. Sawlani

    • University of Michigan, Ann Arbor, MI 48109
    • University of Michigan, Ann Arbor

  • John Foster

    • University of Michigan, Ann Arbor, MI 48109
    • University of Michigan
    • University of Michigan, Ann Arbor

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• Combined plasma and molecular dynamics simulations for a better prediction of plasma surface interactions: Cryogenic etching of silicon with fluorine-containing gases

  ORAL

  Oct. 3, 2013, 11:15 AM – Oct. 3, 2013, 11:30 AM

  Authors

  • Stefan Tinck

    • University of Antwerp

  • Erik Neyts

    • University of Antwerp

  • Annemie Bogaerts

    • University of Antwerp

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• Reversible plasma-based functionalization of advanced carbon materials

  ORAL

  Oct. 3, 2013, 11:30 AM – Oct. 3, 2013, 11:45 AM

  Authors

  • Eva Kovacevic

    • GREMI, University of Orleans

  • Johannes Berndt

    • GREMI, University of Orleans, France
    • GREMI, University of Orleans

  • Thomas Strunskus

    • Christian-Albrechts-University of Kiel, Germany

  • Nicolas Camara

    • GREMAN, Tours, France

  • Christophe Cachoncinlle

    • GREMI, University of Orleans, France

  • Mireille Gaillard

    • GREMI, University of Orleans, France

  • Chantal Boulmer-Leborgne

    • GREMI, University of Orleans, France

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• Optimization of plasma ionization sources for ambient mass spectrometry surface analysis

  ORAL

  Oct. 3, 2013, 11:45 AM – Oct. 3, 2013, 12:00 PM

  Authors

  • Kirsty McKay

    • University of Liverpool

  • Jun-Seok Oh

    • University of Liverpool

  • Andrew Bowfield

    • University of Liverpool

  • Tara Salter

    • National Physical Laboratory

  • James Walsh

    • University of Liverpool

  • Ian Gilmore

    • National Physical Laboratory

  • James Bradley

    • University of Liverpool

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• Plasma-Surface Interactions and Feature Profile Simulations

  ORAL

  Oct. 3, 2013, 12:00 PM – Oct. 3, 2013, 12:15 PM

  Authors

  • Paul Moroz

    • Tokyo Electron US Holdings, Inc.

  • Daniel Moroz

    • University of Pennsylvania

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