Plasma Etching

Presentations

• Challenges in the Plasma Etch Process Development in the sub-20nm Technology Nodes

  COFFEE_KLATCH · Invited

  Oct. 2, 2013, 3:30 PM – Oct. 2, 2013, 4:00 PM

  Authors

  • Kaushik Kumar

    • TEL Technology Center, America, LLC

  View abstract →

• Photo-assisted etching of silicon in halogen-containing plasmas

  ORAL

  Oct. 2, 2013, 4:00 PM – Oct. 2, 2013, 4:15 PM

  Authors

  • Shyam Sridhar

    • University of Houston

  • Weiye Zhu

    • University of Houston

  • Lei Liu

    • University of Houston

  • Demetre Economou

    • University of Houston

  • Vincent M. Donnelly

    • University of Houston

  View abstract →

• Effect of TCP Pulsing in Photon Induced Sub-threshold Etching of Si

  ORAL

  Oct. 2, 2013, 4:15 PM – Oct. 2, 2013, 4:30 PM

  Authors

  • Juline Shoeb

    • Lam Research Corporation

  • Saravanapriyan Sriraman

    • Lam Research Corporation

  • Tom Kamp

    • Lam Research Corporation

  • Alex Paterson

    • Lam Research Corporation

  View abstract →

• Vacuum ultraviolet photon fluxes in argon-containing inductively coupled plasmas

  ORAL

  Oct. 2, 2013, 4:30 PM – Oct. 2, 2013, 4:45 PM

  Authors

  • S.B. Radovanov

    • Applied Materials, Silicon Systems Group, Varian Semiconductor Equipment

  • H.M. Persing

    • Applied Materials, Silicon Systems Group, Varian Semiconductor Equipment

  • S. Wang

    • University of Wisconsin-Madison

  • C.L. Culver

    • University of Wisconsin-Madison

  • J.B. Boffard

    • University of Wisconsin-Madison

  • C.C. Lin

    • University of Wisconsin-Madison

  • A.E. Wendt

    • University of Wisconsin-Madison

  View abstract →

• Reduction Mechanism of Surface Roughness on ArF-Photoresist Using C$_{5}$HF$_{7}$ Gas Plasma

  ORAL

  Oct. 2, 2013, 4:45 PM – Oct. 2, 2013, 5:00 PM

  Authors

  • Yudai Miyawaki

    • Nagoya University

  • Keigo Takeda

    • Nagoya University

  • Hiroki Kondo

    • Nagoya University

  • Kenji Ishikawa

    • Nagoya University

  • Makoto Sekine

    • Nagoya University

  • Azumi Ito

    • ZEON CORPORATIO

  • Hirokazu Matsumoto

    • ZEON CORPORATIO

  • Masaru Hori

    • Nagoya University

  View abstract →

• Molecular Dynamics Analysis of Surface Reaction Kinetics during Si Etching in Cl-based Plasmas: Effects of Etch By-Products Ion Incidence

  ORAL

  Oct. 2, 2013, 5:00 PM – Oct. 2, 2013, 5:15 PM

  Authors

  • Nobuya Nakazaki

    • Department of Aeronautics and Astronautics, Graduate School of Engineering, Kyoto University

  • Yoshinori Takao

    • Department of Aeronautics and Astronautics, Graduate School of Engineering, Kyoto University

  • Koji Eriguchi

    • Department of Aeronautics and Astronautics, Graduate School of Engineering, Kyoto University

  • Kouichi Ono

    • Department of Aeronautics and Astronautics, Graduate School of Engineering, Kyoto University

  View abstract →

• Simulation of microwave pulsing in a radial line slot antenna etch process reactor

  ORAL

  Oct. 2, 2013, 5:15 PM – Oct. 2, 2013, 5:30 PM

  Authors

  • Rochan Upadhyay

    • Esgee Technologies Inc.

  • Kiyotaka Ishibashi

    • Tokyo Electron Limited

  • Laxminarayan Raja

    • The University of Texas at Austin

  View abstract →