A study on measurement of the surface charge accumulation using anodic aluminum oxide template

POSTER

Abstract

As the critical dimension of the nano-device shrinks, an undesired etch profile resulting from the local electric field by the surface charge accumulation is made on the plasma processing. To understand and monitor the surface charge accumulation, the measurement of the voltage difference between top electrode and bottom electrode on the anodic aluminum oxide (AAO) which has high aspect structure is performed in inductively coupled plasma. The voltage difference is changed with external discharge conditions, such as gas pressure, input power, and gas species, and the result is analyzed with the measured plasma parameters.

*This work was supported by SEMES cooperative research project.

Authors

  • Seung-Ju Oh

    • Department of Electrical Engineering, Hanyang University, Seoul 133-791, Korea
    • Department of Electrical Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul 133-791, South Korea

  • Hyo-Chang Lee

    • Department of Electrical Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul 133-791, South Korea

  • Jun-Hyeon Moon

    • Department of Electrical Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul 133-791, South Korea

  • Chin-Wook Chung

    • Department of Electrical Engineering, Hanyang University, Seoul 133-791, Korea
    • Department of Electrical Engineering, Hanyang University
    • Hanyang University
    • Hanyang University, Republic Korea
    • Department of Electrical Engineering, Hanyang University, 17 Haengdang-dong, Seongdong-gu, Seoul 133-791, South Korea

  • Soon-Ho Kwon

    • Department of Material Science and Engineering, Seoul National University, 131 dong 404 ho, Gwanak-ro 599, Gwanak-gu, Seoul 151-742, South Korea

  • Jung-Joong Lee

    • Department of Material Science and Engineering, Seoul National University, 131 dong 404 ho, Gwanak-ro 599, Gwanak-gu, Seoul 151-742, South Korea

  • Il-Gyo Koo

    • Research center, SEMES
    • Research center, SEMES, \#278 Mosi-ri, Cheonan 331-814, South Korea

  • Soo-Jin Lee

    • Research center, SEMES
    • Research center, SEMES, \#278 Mosi-ri, Cheonan 331-814, South Korea

  • Kyo-Seong Seong

    • Research center, SEMES
    • Research center, SEMES, \#278 Mosi-ri, Cheonan 331-814, South Korea