Inductively Coupled Plasmas
FOCUS · ET3 ·
Presentations
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Ferromagnetic Enhanced Inductive Plasma Sources
COFFEE_KLATCH · Invited
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Authors
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Valery Godyak
- University of Michigan and RF Plasma Consulting
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High Pressure Discharge Negative Ion Source
ORAL
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Authors
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Lynn Olson
- Busek Co. Inc.
- Busek Co., Inc.
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John Blandino
- Worcester Polytechnic Institute
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Nikolaos Gatsonis
- Worcester Polytechnic Institute
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Three-Dimensional Electromagnetic Plasma Modeling of Inductively Coupled Plasma Source and Antenna
ORAL
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Authors
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Shahid Rauf
- Applied Materials, Inc.
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Ankur Agarwal
- Applied Materials, Inc.
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Jason Kenney
- Applied Materials, Inc.
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Ming-Feng Wu
- Applied Materials, Inc.
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Ken Collins
- Applied Materials, Inc.
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Evidence of weak plasma series resonance heating in the H-mode of neon and neon/argon inductively coupled plasmas
ORAL
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Authors
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A.E. Wendt
- University of Wisconsin - Madison
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John B. Boffard
- University of Wisconsin - Madison
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R.O. Jung
- University of Wisconsin - Madison
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Chun C. Lin
- University of Wisconsin - Madison
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L.E. Aneskavich
- University of Wisconsin - Madison
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Model of an Ar/O$_{2}$ inductive discharge used for plasma spray deposition
ORAL
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Authors
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Claudia Lazzaroni
- LSPM, CNRS UPR 3407, Universit\'e Paris 13
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Mehrdad Nikravech
- LSPM, CNRS UPR 3407, Universit\'e Paris 13
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Pascal Chabert
- LPP, CNRS, Ecole Polytechnique, UPMC, Paris XI
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