Plasma Etching

Presentations

• Mechanism of Si and metal etching based on sticking reaction model

  COFFEE_KLATCH · Invited

  Nov. 17, 2011, 9:30 AM – Nov. 17, 2011, 10:00 AM

  Authors

  • Masaru Izawa

    • Hitachi High-Technologies Corp.

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• Noninvasive sheath diagnostics in an inductively coupled plasma using a remote RF sensor

  ORAL

  Nov. 17, 2011, 10:00 AM – Nov. 17, 2011, 10:15 AM

  Authors

  • Satoru Kobayashi

    • Applied Materials

  • Shahid Rauf

    • Applied Materials

  • ken Collins

    • Applied Materials

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• Mechanism for Plasma Etching of Shallow Trench Isolation Features in an Inductively Coupled Plasma

  ORAL

  Nov. 17, 2011, 10:15 AM – Nov. 17, 2011, 10:30 AM

  Authors

  • Ankur Agarwal

    • Applied Materials Inc.

  • Shahid Rauf

    • Applied Materials Inc.

  • Jim He

    • Applied Materials Inc.

  • Jinhan Choi

    • Applied Materials Inc.

  • Ken Collins

    • Applied Materials Inc.

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• Deposition Step in MEMS Time Multiplexed Etch

  ORAL

  Nov. 17, 2011, 10:30 AM – Nov. 17, 2011, 10:45 AM

  Authors

  • Lawrence Overzet

    • University of Texas at Dallas

  • Iqbal Saraf

    • University of Texas at Dallas

  • Matthew Goeckner

    • University of Texas at Dallas

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• Study on modification process of photoresist by fluorocarbon ions and radicals

  ORAL

  Nov. 17, 2011, 10:45 AM – Nov. 17, 2011, 11:00 AM

  Authors

  • Takuya Takeuchi

    • Nagoya University

  • Shinpei Amasaki

  • Keigo Takeda

  • Kenji Ishikawa

  • Hiroki Kondo

  • Makoto Sekine

  • Masaru Hori

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• Mechanism of Highly Selective SiO$_{2}$ Etching over Si using New Alternative Gas, C$_{5}$HF$_{7}$

  ORAL

  Nov. 17, 2011, 11:00 AM – Nov. 17, 2011, 11:15 AM

  Authors

  • Yudai Miyawaki

    • Nagoya University

  • Keigo Takeda

    • Nagoya University

  • Hiroki Kondo

    • Nagoya University

  • Kenji Ishikawa

    • Nagoya University

  • Makoto Sekine

    • Nagoya University

  • Masaru Hori

    • Nagoya University

  • Atsuyo Yamazaki

    • ZEON CORPORATION

  • Azumi Ito

    • ZEON CORPORATION

  • Hirokazu Matsumoto

    • ZEON CORPORATION

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• Exploring High AR 2$\mu $m TSV (25:1)

  ORAL

  Nov. 17, 2011, 11:15 AM – Nov. 17, 2011, 11:30 AM

  Authors

  • Maarten Kostermans

    • imec

  • Ulrich Baier

    • imec

  • Werner Boullart

    • imec

  • Mohand Brouri

    • Lam

  • Johan Vertommen

    • Lam

  • Arnaud Pageau

    • Polytech Orleans

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• 2D etch rate uniformity improvement in a parallel turn ICP system: numerical modeling and experiment

  ORAL

  Nov. 17, 2011, 11:30 AM – Nov. 17, 2011, 11:45 AM

  Authors

  • Junghoon Joo

    • Kunsan National University

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• Simulation study of SF6 plasma etching in the GEC reference cell

  ORAL

  Nov. 17, 2011, 11:45 AM – Nov. 17, 2011, 12:00 PM

  Authors

  • Sergio Lopez-Lopez

    • University College London and Quantemol Ltd.

  • Brent Walker

    • University College London and Quantemol Ltd.

  • James Munro

    • University College London and Quantemol Ltd.

  • Jonathan Tennyson

    • University College London and Quantemol Ltd.
    • University College London

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• Fourier Transform Infrared Absorption Spectroscopy of Gas-Phase and Surface Reaction Products during Si Etching in Inductively Coupled Cl$_{2}$ Plasmas

  ORAL

  Nov. 17, 2011, 12:00 PM – Nov. 17, 2011, 12:15 PM

  Authors

  • Hiroki Miyata

  • Hirotaka Tsuda

  • Daisuke Fukushima

  • Yoshinori Takao

  • Koji Eriguchi

  • Kouichi Ono

    • Kyoto University

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• Molecular Dynamics Analysis of Ion Incident Energy and Angle Dependences of Si etching with Cl, Br, and HBr beams

  ORAL

  Nov. 17, 2011, 12:15 PM – Nov. 17, 2011, 12:30 PM

  Authors

  • Nobuya Nakazaki

    • Kyoto University

  • Hirotaka Tsuda

  • Yoshinori Takao

  • Koji Eriguchi

  • Kouichi Ono

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