Electron Transport in Ar/H2 Mixtures
POSTER
Abstract
In this work we present transport coefficients for electrons in Ar/H2 mixtures for the conditions used in plasma assisted technologies for semiconductor production. We used numerical solution of Boltzman equation analysis obtained by program ELENDIF and Monte Carlo technique. For the conditions of very high electric fields is shown contribution of backscattered electrons of Ha emission for stainless steel and graphite anode surface.