Phenol decomposition by pulsed-plasma exposure in oxygen and argon atmosphere

POSTER

Abstract

Phenol in an aqueous solution is decomposed by the exposure of pulsed-discharge plasma, and by-products are investigated by gas chromatograph mass spectrometry. When Ar is used as a background gas, catechol, hydroquinone and 4-hydroxy-2-cyclohexene-1-on are produced, and no O$_{3}$ is produced; therefore, OH radicals generated in the plasma can initiate the decomposition of phenol, and 4-hydroxy-2-cyclohexene-1-on can be produced. Further, 4-hydroxy-2-cyclohexene-1-on can be converted into catechol and hydroquinone. When O$_{2}$ is used as a background gas, catechol, hydroquinone, formic acid, maleic acid, succinic acid and 4,6-dihydroxy-2,4-hexadienoic acid are produced. Therefore, phenol is probably decomposed into 4,6-dihydroxy-2,4-hexadienoic acid by 1,3-dipolar addition reaction with O$_{3}$, and 4,6-dihydroxy-2,4-hexadienoic acid can be decomposed into maleic acid and succinic acid by 1,3-dipolar addition reaction with O$_{3}$. Oxalic acid is possibly another by-product from 4,6-dihydroxy-2,4-hexadienoic acid, since formic acid, which is produced from oxalic acid, is detected.

Authors

  • Kohki Satoh

    • Muroran Institute of Technology
    • Graduate School of Engineering, Muroran Institute of Technology
  • Haruki Shiota

    • Muroran Institute of Technology
  • Hideyuki Itabashi

    • Muroran Institute of Technology
  • Hidenori Itoh

    • Muroran Institute of Technology
    • Graduate School of Engineering, Muroran Institute of Technology