Plasma Deposition

Presentations

• Deposition profile control of carbon films on trenched substrate by simultaneous plasma CVD and plasma etching

  ORAL

  Nov. 15, 2011, 2:00 PM – Nov. 15, 2011, 2:15 PM

  Authors

  • Masaharu Shiratani

    • Kyushu University

  • Tatsuya Urakawa

    • Kyushu University

  • Daisuke Yamashita

    • Kyushu University

  • Kunihiro Kamataki

    • Kyushu University

  • Naho Itagaki

    • Kyushu University

  • Giichiro Uchida

    • Kyushu University

  • Kazunori Koga

    • Kyushu University

  • Yuichi Setsuhara

    • Osaka University

  • Makoto Sekine

    • Nagoya University

  • Masaru Hori

    • Nagoya University

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• Using plasmas to control the nucleation, morphology and properties of self-organized graphene nanosheets

  ORAL

  Nov. 15, 2011, 2:15 PM – Nov. 15, 2011, 2:30 PM

  Authors

  • Shailesh Kumar

    • CSIRO CMSE

  • Dong Han Seo

    • The University of Sydney

  • Kostya (Ken) Ostrikov

    • CSIRO CMSE

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• Atmospheric pressure cold plasma treatment of cellulose based fillers for wood plastic composites

  ORAL

  Nov. 15, 2011, 2:30 PM – Nov. 15, 2011, 2:45 PM

  Authors

  • William Lekobou

    • Washington State University

  • Karl Englund

    • Washington State University

  • Patrick Pedrow

    • Washington State University

  • Louis Scudiero

    • Washington State University

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• Behavior of radicals in SiH$_4$/H$_2$ plasma for fabrication of solar cell using silicon thin film

  ORAL

  Nov. 15, 2011, 2:45 PM – Nov. 15, 2011, 3:00 PM

  Authors

  • Yusuke Abe

    • Nagoya University

  • Atsushi Fukushima

    • Nagoya University

  • Ya Lu

    • Nagoya University

  • Keigo Takeda

    • Nagoya University

  • Hiroki Kondo

    • Nagoya University

  • Kenji Ishikawa

    • Nagoya University

  • Makoto Sekine

    • Nagoya University

  • Masaru Hori

    • Nagoya University

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• Electrical investigation of the effect of gas additives on silicon deposition plasmas

  ORAL

  Nov. 15, 2011, 3:00 PM – Nov. 15, 2011, 3:15 PM

  Authors

  • M. Sobolewski

    • NIST

  • R. Ridgeway

    • Air Products

  • M. Bitner

    • Air Products

  • P. Hurley

    • Air Products

  • D. Sinatore

    • Air Products

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• On Generation and Propagation of the Plasma Ion Beam for Plasma Ion Assisted Deposition (PIAD) of Optical Coatings

  ORAL

  Nov. 15, 2011, 3:15 PM – Nov. 15, 2011, 3:30 PM

  Authors

  • J. Harhausen

    • Leibniz Institute for Plasma Science and Technology

  • Ralf Peter Brinkmann

    • RUB
    • Ruhr-University Bochum
    • Ruhr-Universit\"at Bochum
    • Ruhr University

  • R. Foest

    • Leibniz Institute for Plasma Science and Technology

  • A. Ohl

    • Leibniz Institute for Plasma Science and Technology

  • B. Schr\"oder

    • Theoretical Electrical Engineering, Ruhr University Bochum
    • Ruhr-Universit\"at Bochum

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