Plasma Diagnostics III: Reactive Plasmas

Presentations

• Increasing understanding of the plasma-surface boundary layer and surface chemistry using optical sum frequency generation diagnostic tools

  COFFEE_KLATCH · Invited

  Oct. 8, 2010, 10:30 AM – Oct. 8, 2010, 11:00 AM

  Authors

  • Greg Hebner

    • Sandia National Laboratories

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• Non-contact monitoring of Si substrate temperature during plasma etching using optical low-coherence interferometry

  ORAL

  Oct. 8, 2010, 11:00 AM – Oct. 8, 2010, 11:15 AM

  Authors

  • Takayuki Ohta

    • Faculty of Systems Engineering, Wakayama University
    • Wakayama University
    • Faculty of systems engineering, Wakayama University

  • Chishio Koshimizu

    • Yamanashi Technology Development Center, Tokyo Electron AT

  • Shigeki Tuchitani

    • Faculty of Systems Engineering, Wakayama University

  • Masufumi Ito

    • Faculty of Science and Technology, Meijo University

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• Wafer-level plasma parameters measurements in a multi-frequency capacitively coupled plasma discharge

  ORAL

  Oct. 8, 2010, 11:15 AM – Oct. 8, 2010, 11:30 AM

  Authors

  • L. Dorf

    • Applied Materials

  • Shahid Rauf

    • Applied Materials
    • Applied Materials Inc.

  • J. Kenney

    • Applied Materials

  • K. Bera

    • Applied Materials

  • N. Misra

    • Applied Materials

  • Ken Collins

    • Applied Materials
    • Applied Materials Inc.

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• Improvements of modulated beam mass spectrometry: application to pulsed plasma

  ORAL

  Oct. 8, 2010, 11:30 AM – Oct. 8, 2010, 11:45 AM

  Authors

  • Fran\c{c}ois Boulard

    • Laboratoire des Technologies de la Micro\'electronique, CNRS

  • Gilles Cunge

    • Laboratoire des Technologies de la Micro\'electronique, CNRS
    • LTM-CNRS, Grenoble, France
    • LTM-CNRS
    • CNRS/LTM

  • Thierry Chevolleau

    • Laboratoire des Technologies de la Micro\'electronique, CNRS

  • Nader Sadeghi

    • LSP, Universit\'e Joseph Fourier and CNRS
    • LTM-CNRS
    • Univ. Grenoble \& CNRS, France
    • LSP, Univ. \& CNRS Grenoble, France
    • CNRS/LSP

  • Olivier Joubert

    • Laboratoire des Technologies de la Micro\'electronique, CNRS
    • CNRS

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• Time-resolved electron density and OES measurements for studying the surface loss rates of H and Cl atoms in a Cl$_2$-H$_2$ ICP plasma

  ORAL

  Oct. 8, 2010, 11:45 AM – Oct. 8, 2010, 12:00 PM

  Authors

  • Garrett Curley

    • IEMN-CNRS, University of Lille 1, Lille, France / LPN-CNRS, Marcoussis, France

  • Lina Gatilova

    • LPN-CNRS, Marcoussis, France

  • Stephane Guilet

    • LPN-CNRS, Marcoussis, France

  • Sophie Bouchoule

    • LPN-CNRS, Marcoussis, France

  • Gurusharan Gogna

    • NCPST, Dublin City University, Dublin, Ireland

  • Nishant Sirse

    • NCPST, Dublin City University, Dublin, Ireland

  • Shantanu Karkari

    • NCPST, Dublin City University, Dublin, Ireland

  • Jean-Paul Booth

    • LPP, Ecole Polytechnique, Palaiseau, France

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• Time-Resolved Emission and Electrical Diagnosis of High Pressure H$_{2}$ and SiH$_{4}$/H$_{2}$ RF Discharges

  ORAL

  Oct. 8, 2010, 12:00 PM – Oct. 8, 2010, 12:15 PM

  Authors

  • Eleftherios Amanatides

    • Plasma Technology Lab., Dpt. of Chem. Engineering, University of Patras

  • Dimitrios Mataras

    • Plasma Technology Lab., Dpt. of Chem. Engineering, University of Patras

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• A comprehensive GD-OES and GD-MS study to elucidate the effect of trace molecular gases (O$_{2}$, H$_{2}$, and N$_{2}$) on argon-based glow discharge plasmas

  ORAL

  Oct. 8, 2010, 12:15 PM – Oct. 8, 2010, 12:30 PM

  Authors

  • S. Mushtaq

  • J.C. Pickering

  • E.B.M. Steers

  • P. Horvath

  • J.A. Whitby

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