Plasma Etching II

Presentations

• Plasma-surface interactions in plasma etching processes for nanometer-scale microelectronic devices

  COFFEE_KLATCH · Invited

  Oct. 7, 2010, 4:00 PM – Oct. 7, 2010, 4:30 PM

  Authors

  • Kouichi Ono

    • Kyoto University

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• Simulations of an Ar/HBr/O$_2$ microwave source etch process and the effect of SiBr and SiBr$_2$ cross-sections on computed etch-profiles

  ORAL

  Oct. 7, 2010, 4:30 PM – Oct. 7, 2010, 4:45 PM

  Authors

  • James Munro

    • University College London

  • Jonathan Tennyson

    • University College London

  • Song-Yun Kang

    • Tokyo Electron Limited

  • Daniel Brown

    • Quantemol Ltd.

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• Global Models for Virtual Metrology and Closed Loop Process Control

  ORAL

  Oct. 7, 2010, 4:45 PM – Oct. 7, 2010, 5:00 PM

  Authors

  • Stephen Daniels

    • Dublin City University
    • NCPST and School of Electronic Engineering, DCU
    • NCPST, DCU

  • Yang Zhang

    • Dublin City University
    • School of Electronic Engineering, DCU

  • Bernard Keville

    • Dublin City University
    • NCPST, School of Physical Sciences, Dublin City University

  • Evgueni Gudimenko

    • Dublin City University

  • Chanel Hayden

    • Dublin City University

  • Anthony Holohan

    • Dublin City University
    • School of Electronic Engineering, DCU

  • Miles Turner

    • Dublin City University
    • Dublin City University, Ireland
    • National Centre For Plasma Science and Technology, Dublin City University, Ireland
    • NCPST, Dublin City University, Dublin 9, Ireland
    • NCPST, School of Physical Sciences, DCU
    • NCPST, DCU

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• Fine ion energy control for sub-32 nm node device RIE using pulsed-DC superimposed 100 MHz rf CCP

  COFFEE_KLATCH · Invited

  Oct. 7, 2010, 5:00 PM – Oct. 7, 2010, 5:30 PM

  Authors

  • H. Hayashi

    • Toshiba Corporate Research \& Development Center, 8 Shinsugita-cho, Isogo-ku, Yokohama, Japan

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• Modification of Si-O-Si Structure in Porous SiOCH Low-$k$ Films with Ions, Radicals, and VUV Radiation in O$_{2}$ Plasma

  ORAL

  Oct. 7, 2010, 5:30 PM – Oct. 7, 2010, 5:45 PM

  Authors

  • Makoto Sekine

    • Nagoya University

  • Hiroshi Yamamoto

    • Nagoya University

  • Kohei Asano

    • Nagoya University

  • Keigo Takeda

    • Nagoya University

  • Kenji Ishikawa

    • Nagoya University

  • Hiroki Kondo

    • Nagoya University

  • Masaru Hori

    • Nagoya University

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• Study of a Charging Voltage during SiO$_{2}$ Etching in a 2f-CCP

  ORAL

  Oct. 7, 2010, 5:45 PM – Oct. 7, 2010, 6:00 PM

  Authors

  • Takashi Yagisawa

    • Keio University

  • Tetsuya Tatsumi

  • Toshiaki Makabe

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