Plasma Deposition I

Presentations

• Density of copper atoms in the ground and metastable states in an argon magnetron discharge correlated to the Cu deposition rate

  ORAL

  Oct. 5, 2010, 4:00 PM – Oct. 5, 2010, 4:15 PM

  Authors

  • Nader Sadeghi

    • LSP, Universit\'e Joseph Fourier and CNRS
    • LTM-CNRS
    • Univ. Grenoble \& CNRS, France
    • LSP, Univ. \& CNRS Grenoble, France
    • CNRS/LSP

  • Hamid Naghshara

    • Faculty of Physics, Univ. Tabriz, Iran

  • Sirous Khorram

    • Faculty of Physics, Univ. Tabriz, Iran

  • Samad Sobhanian

    • Faculty of Physics, Univ. Tabriz, Iran

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• TiO$_{2}$/Polyaniline nanocomposite films prepared by modified plasma polymerization process

  ORAL

  Oct. 5, 2010, 4:15 PM – Oct. 5, 2010, 4:30 PM

  Authors

  • Joyanti Chutia

    • Institute of Advanced Study in Science and Technology

  • Arup Ratan Pal

    • Institute of Advanced Study in Science and Technology

  • Bimal Kumar Sarma

    • Indian Institute of Technology

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• Atmospheric pressure plasma liquid deposition of Cu nanoparticles onto P4VP-grafted-PTFE surface and their autocatalytic characteristics

  ORAL

  Oct. 5, 2010, 4:30 PM – Oct. 5, 2010, 4:45 PM

  Authors

  • Nobuyuki Zettsu

    • Research Center for Ultra-precision Science and Technology, Graduate School of Engineering, Osaka University
    • Research Center for Ultra-Precision Science and Technology, Graduate School of Engineering, Osaka University

  • Hiroki Akiyama

    • Research Center for Ultra-precision Science and Technology, Graduate School of Engineering, Osaka University

  • Kazuya Yamamura

    • Research Center for Ultra-precision Science and Technology, Graduate School of Engineering, Osaka University
    • Research Center for Ultra-Precision Science and Technology, Graduate School of Engineering, Osaka University
    • Osaka University

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• Formation of Highly-Ordered Nanoparticle Structure Using Controlled Gas-Liquid Interfacial Plasmas

  ORAL

  Oct. 5, 2010, 4:45 PM – Oct. 5, 2010, 5:00 PM

  Authors

  • Toshiro Kaneko

    • Department of Electronic Engineering, Tohoku University
    • Tohoku University

  • Takashi Harada

    • Department of Electronic Engineering, Tohoku University

  • Rikizo Hatakeyama

    • Department of Electronic Engineering, Tohoku University

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• Effect of dual HiPIMS discharge parameters on formation and crystallography of antimicrobial Ti-Cu films

  ORAL

  Oct. 5, 2010, 5:00 PM – Oct. 5, 2010, 5:15 PM

  Authors

  • Rainer Hippler

    • University of Greifswald, Germany

  • Vitezslav Stranak

    • University of Greifswald, Germany

  • Harm Wulff

    • University of Greifswald, Germany

  • Robert Bogdanowicz

    • University of Greifswald, Germany

  • Zdenek Hubicka

    • Academy of Sciences of the Czech Rep., Institute of Physics, Prague

  • Carmen Zietz

    • University of Rostock, Germany

  • Rainer Bader

    • University of Rostock, Germany

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• Deposition of a-C:H:N plasma polymer thin films for the functionalization of textiles

  ORAL

  Oct. 5, 2010, 5:15 PM – Oct. 5, 2010, 5:30 PM

  Authors

  • Dirk Hegemann

    • Empa

  • Sebastien Guimond

    • Empa

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• Internal DLC Coating of Narrow Metal Tubes with High-Density Near Plasma Sustained by Microwave Propagation along Plasma-Sheath Interfaces

  ORAL

  Oct. 5, 2010, 5:30 PM – Oct. 5, 2010, 5:45 PM

  Authors

  • Hiroyuki Kousaka

    • Nagoya University

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• Deep Silicon Trench Oxidation in Downstream of Surface-wave Oxygen Plasma

  ORAL

  Oct. 5, 2010, 5:45 PM – Oct. 5, 2010, 6:00 PM

  Authors

  • Haruo Shindo

    • Tokai University

  • Jyun Koike

    • Tokai University

  • Yuuto Igarashi

    • Tokai University

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