The effect of substrate temperature on microstructure of nano-crystalline Si thin films deposited by ICP assisted magnetron sputtering at low temperature
POSTER
Abstract
The hydrogenated nano-crystalline silicon thin films were synthesized on glass substrate at low temperature using inductively coupled plasma (ICP) assisted magnetron sputtering. One-turn ICP coil was installed to dissociate the hydrogen molecules by the induced electrical field inside the chamber. According to the change of the substrate temperature, the microstructure characteristics of deposited films were investigated.