Materials Processing

Presentations

• Reaction mechanisms in patterning complex oxide materials by plasmas

  COFFEE_KLATCH · Invited

  Oct. 22, 2009, 1:30 PM – Oct. 22, 2009, 2:00 PM

  Authors

  • Jane P. Chang

    • University of California, Los Angeles

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• Surface Modification of Polymer Photoresists in Fluorocarbon Plasma Etching

  ORAL

  Oct. 22, 2009, 2:00 PM – Oct. 22, 2009, 2:15 PM

  Authors

  • Mingmei Wang

    • Iowa State University

  • Mark Kushner

    • University of Michigan

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• Factors Affecting the Sealing Efficiency of Low-$k$ Dielectric Surface Pores Using Successive He and Ar/NH$_{3}$ Plasma Treatment

  ORAL

  Oct. 22, 2009, 2:15 PM – Oct. 22, 2009, 2:30 PM

  Authors

  • Juline Shoeb

    • Iowa State University

  • Mark Kushner

    • University of Michigan

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• The influence of He plasma pretreatment on O and H atom interaction with low-k nanoporous materials

  ORAL

  Oct. 22, 2009, 2:30 PM – Oct. 22, 2009, 2:45 PM

  Authors

  • O.V. Braginsky

    • Nuclear Physics Institute, Moscow State University, Moscow, Russia

  • A.S. Kovalev

    • Nuclear Physics Institute, Moscow State University, Moscow, Russia

  • D.V. Lopaev

    • Nuclear Physics Institute, Moscow State University, Moscow, Russia

  • E.M. Malykhin

    • Nuclear Physics Institute, Moscow State University, Moscow, Russia

  • Yu. A. Mankelevich

    • Nuclear Physics Institute, Moscow State University, Moscow, Russia

  • T.V. Rakhimova

    • Nuclear Physics Institute, Moscow State University, Moscow, Russia

  • A.T. Rakhimov

    • Nuclear Physics Institute, Moscow State University, Moscow, Russia

  • A.N. Vasilieva

    • Nuclear Physics Institute, Moscow State University, Moscow, Russia

  • S.M. Zyryanov

    • Nuclear Physics Institute, Moscow State University, Moscow, Russia

  • M.R. Baklanov

    • IMEC, Leuven, Belgium

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• Investigation of the etching mechanisms of Ar/Cl$_{2}$/O$_{2}$ inductively coupled plasmas on silicon by means of modelling and experiments

  ORAL

  Oct. 22, 2009, 2:45 PM – Oct. 22, 2009, 3:00 PM

  Authors

  • Stefan Tinck

    • University of Antwerp

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• Development and validation of a C5F8/Ar/O2 mixture chemistry model using quantum chemistry methods

  COFFEE_KLATCH · Invited

  Oct. 22, 2009, 3:00 PM – Oct. 22, 2009, 3:30 PM

  Authors

  • Song-yun Kang

    • Tokyo Electron Ltd.
    • Tokyo Electron Ltd

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