Plasma-Surface Interactions
FOCUS · SR3 ·
Presentations
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Plasma surface interactions in fluorocarbon systems
COFFEE_KLATCH · Invited
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Authors
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Matthew Goeckner
- The University of Texas at Dallas
- University of Texas at Dallas
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Temperature Impact on Plasma-Surface Interactions in an FC Plasma Environment
ORAL
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Authors
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Caleb Nelson
- University of Texas at Dallas
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Iqbal Saraf
- University of Texas at Dallas
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Lawrence Overzet
- The University of Texas at Dallas
- University of Texas at Dallas
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Matthew Goeckner
- The University of Texas at Dallas
- University of Texas at Dallas
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SiO$_{2}$ Film Etching Process Using Environment-Friendly New Gas C$_{5}$F$_{7}$H
ORAL
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Authors
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Yudai Miyawaki
- Nagoya University
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Keigo Takeda
- Nagoya University
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Azumi Ito
- Zeon Corporation
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Masahiro Nakamura
- Zeon Corporation
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Makoto Sekine
- Nagoya University
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Masaru Hori
- Nagoya University
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Plasma-surface interactions during Si etching in Cl- and Br-based plasmas: An empirical and atomistic study
ORAL
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Authors
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Hirotaka Tsuda
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Tatsuya Nagaoka
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Hiroki Miyata
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Yoshinori Takao
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Koji Eriguchi
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Kouichi Ono
- Kyoto University
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Analysis of the surface reactions of ArF photoresist during fluorocarbon plasma etching by XPS
ORAL
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Authors
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Takuya Takeuchi
- Nagoya University
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Makoto Sekine
- Nagoya University
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Hirotaka Toyoda
- Nagoya University
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Keigo Takeda
- Nagoya University
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Masaru Hori
- Nagoya University
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Song-Yun Kang
- Tokyo Electron Ltd.
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Ikuo Sawada
- Tokyo Electron Ltd.
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Determination of gas phase and surface reactions in plasma polymerization
ORAL
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Authors
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Dirk Hegemann
- Empa, St.Gallen/Switzerland
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Role of plasma activation in the kinetics of CNT growth in PECVD process
ORAL
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Authors
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Irina Lebedeva
- Kintech Lab Ltd
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Alexey Gavrikov
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Alexey Baranov
- Kintech Lab Ltd
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Maxim Belov
- Kintech Lab Ltd
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Andrey Knizhnik
- Kintech Lab Ltd
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Boris Potapkin
- Kintech Lab, Moscow, Russia
- Kintech Lab Ltd
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Timothy Sommerer
- GE Global Research Center
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