Computational Methods for Plasmas

Presentations

• Numerical Simulation on the Profile of Plasma and Radicals in Plasma Chambers

  COFFEE_KLATCH · Invited

  Oct. 17, 2008, 9:00 AM – Oct. 17, 2008, 9:30 AM

  Authors

  • Ikuo Sawada

    • Tokyo Electron Limited

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• ABSTRACT WITHDRAWN

  Oct. 17, 2008, 9:30 AM – Oct. 17, 2008, 9:45 AM

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• Quantitative improvement in MD-based plasma etching simulator: Si etching by halogen-including plasmas

  ORAL

  Oct. 17, 2008, 9:45 AM – Oct. 17, 2008, 10:00 AM

  Authors

  • Hiroaki Ohta

  • Tatsuya Nagaoka

  • Akira Iwakawa

  • Koji Eriguchi

  • Kouichi Ono

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• Finite volume formulation of low-temperature plasma equations and numerical solution in one dimension

  ORAL

  Oct. 17, 2008, 10:00 AM – Oct. 17, 2008, 10:15 AM

  Authors

  • Mirko Vukovic

    • Tokyo Electron, U. S. Holdings

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• 3-Dimensional Modeling of Capacitively and Inductively Coupled Plasma Etching Systems

  COFFEE_KLATCH · Invited

  Oct. 17, 2008, 10:15 AM – Oct. 17, 2008, 10:45 AM

  Authors

  • Shahid Rauf

    • Applied Materials, Inc.

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• Prediction of SiO$_{2}$ etching profile under the presence of RIE-lag effect

  ORAL

  Oct. 17, 2008, 10:45 AM – Oct. 17, 2008, 11:00 AM

  Authors

  • Takashi Yagisawa

    • Keio University

  • Toshiaki Makabe

    • Keio University

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