Inductively and Capacitively Coupled Plasmas

Presentations

• 3-Dimensional Modeling of Capacitively-Coupled Plasmas with Asymmetric Reactor Elements

  ORAL

  Oct. 16, 2008, 3:00 PM – Oct. 16, 2008, 3:15 PM

  Authors

  • Jason Kenney

    • Applied Materials, Inc.

  • Shahid Rauf

    • Applied Materials, Inc.

  • Ken Collins

    • Applied Materials, Inc.

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• Comparison between fluid simulations and experiments in inductively-coupled Ar/Cl$_{2}$ plasmas

  ORAL

  Oct. 16, 2008, 3:15 PM – Oct. 16, 2008, 3:30 PM

  Authors

  • Emilie Despiau-Pujo

    • LPTP, Ecole Polytechnique, France

  • Cormac S. Corr

    • SP3, Australian National University

  • Pascal Chabert

    • LPTP, Ecole Polytechnique, France
    • LPTP, Ecole Polytechnique
    • LPTP - CNRS UMR 7648
    • CNRS-Ecole Polytechnique, France

  • William G. Graham

    • Queen's University Belfast, Northern Ireland

  • Fernando G. Marro

    • Queen's University Belfast, Northern Ireland

  • David Graves

    • University of California, Berkeley, USA
    • University of California at Berkeley

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• Electron series resonance in an inductive ion etching reactor

  ORAL

  Oct. 16, 2008, 3:30 PM – Oct. 16, 2008, 3:45 PM

  Authors

  • Hyo-Chang Lee

    • Electrical Engineering, Hanyang University, Republic of Korea

  • Jin-Young Bang

    • Electrical Engineering, Hanyang University, Republic of Korea

  • CW Chung

    • Electrical Engineering, Hanyang University, Republic of Korea
    • Department of Electrical Engineering, Hanyang University, Republic of Korea
    • Hanyang University
    • Department of Electrical Engineering,Hanyang University, Republic of Korea
    • Hanyang University, Korea

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• Electron and Ion Energy Distributions in Dual Frequency Capacitively Coupled Plasmas Considering Wave Effects

  ORAL

  Oct. 16, 2008, 3:45 PM – Oct. 16, 2008, 4:00 PM

  Authors

  • Yang Yang

    • Iowa State University

  • Mark J. Kushner

    • Iowa State University

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• Separate control of ion flux and energy in capacitively coupled RF discharges via the Electrical Asymmetry Effect

  ORAL

  Oct. 16, 2008, 4:00 PM – Oct. 16, 2008, 4:15 PM

  Authors

  • Julian Schulze

    • Ruhr University Bochum

  • Zoltan Donko

    • Hungarian Academy for Science

  • Brian Heil

    • Ruhr University Bochum

  • Uwe Czarnetzki

    • Ruhr University Bochum

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• The 2nd Harmonic ECR Microplasma in Narrow Closed Space for Low Pressure Conditions

  ORAL

  Oct. 16, 2008, 4:15 PM – Oct. 16, 2008, 4:30 PM

  Authors

  • Hiroshi Fujiyama

    • Nagasaki University

  • Akihiro Yukishige

    • Nagasaki University

  • Ke Yan

    • Nagasaki University

  • Masanori Shinohara

    • Nagasaki University

  • Tatsuyuki Nakatani

    • Toyo Advanced Technology

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