Material Processing I

Presentations

• Plasma Characterization of MPCVD Discharges for Nanocrystalline Diamond Deposition

  ORAL

  Oct. 16, 2008, 12:30 PM – Oct. 16, 2008, 12:45 PM

  Authors

  • Leigh Winfrey

    • NC State University

  • Steve Shannon

    • NC State University
    • NC State University, Department of Nuclear Engineering

  • Richard Chromik

    • McGill University

  • Kathryn Wahl

    • Naval Research Laboratory

  • Robert Nemanich

    • Arizona State University

  • Mohamed Bourham

    • NC State University

  View abstract →

• Nano-particle manipulation using pulse RF discharges with amplitude modulation

  ORAL

  Oct. 16, 2008, 12:45 PM – Oct. 16, 2008, 1:00 PM

  Authors

  • Shinya Iwashita

    • Kyushu University

  • Hiroshi Miyata

    • Kyushu University

  • Hidefumi Matsuzaki

    • Kyushu University

  • Kazunori Koga

    • Kyushu University

  • Masaharu Shiratani

    • Kyushu Univ., JST, CREST
    • Kyushu University, JST, CREST
    • Kyushu University

  View abstract →

• GEC Student Award for Excellence Finalist: Plasma controlled adatom delivery and (re)distribution: enabling uninterrupted low temperature growth of ultra long vertically aligned carbon nanotubes

  ORAL

  Oct. 16, 2008, 1:00 PM – Oct. 16, 2008, 1:15 PM

  Authors

  • Eugene Tam

    • The University of Sydney

  • Kostya Ostrikov

    • CSIRO
    • The University of Sydney

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• Thermal treatment influence on magnetoresistive properties of the MgF$_2$ - Co and and MgF$_2$ - Permalloy films prepared by thermoelectron sustained vacuum discharge

  ORAL

  Oct. 16, 2008, 1:15 PM – Oct. 16, 2008, 1:30 PM

  Authors

  • C.P. Lungu

    • National Institute for Laser, Plasma and Radiation Physics

  • I. Mustata

    • National Institute for Laser, Plasma and Radiation Physics

  • A. Anghel

    • National Institute for Laser, Plasma and Radiation Physics

  • A.M. Lungu

    • National Institute for Laser, Plasma and Radiation Physics

  • O. Pompilian

    • National Institute for Laser, Plasma and Radiation Physics

  • C. Porosnicu

    • National Institute for Laser, Plasma and Radiation Physics

  • C. Ticos

    • National Institute for Laser, Plasma and Radiation Physics

  • V. Kuncser

    • National Institute for Material Physics

  • G. Schinteie

    • National Institute for Material Physics

  • D. Predoi

    • National Institute for Material Physics

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• High Aspect Ratio HBr Based Dry Etching of GaInAsP/InP for Nanoscale Photonic Couplers

  ORAL

  Oct. 16, 2008, 1:30 PM – Oct. 16, 2008, 1:45 PM

  Authors

  • Nahid Sultana

    • The University of Texas at Dallas

  • Wei Zhou

    • The University of Texas at Dallas

  • Duncan MacFarlane

    • The University of Texas at Dallas

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• Control of deposition profile of plasma CVD hard carbon films on substrates with trenches

  ORAL

  Oct. 16, 2008, 1:45 PM – Oct. 16, 2008, 2:00 PM

  Authors

  • Masaharu Shiratani

    • Kyushu Univ., JST, CREST
    • Kyushu University, JST, CREST
    • Kyushu University

  • Jun Umetsu

    • Kyushu University

  • Kazuhiko Inoue

    • Kyushu University

  • Takuya Nomura

    • Kyushu University

  • Hidefumi Matsuzaki

    • Kyushu University

  • Kazunori Koga

    • Kyushu University, JST, CREST

  • Yuichi Setsuhara

    • Osaka University, JST, CREST

  • Makoto Sekine

    • Nagoya University, JST, CREST

  • Masaru Hori

    • Nagoya University, JST, CREST

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• Plasma assisted deposition of metal fluorides for 193nm applications

  ORAL

  Oct. 16, 2008, 2:00 PM – Oct. 16, 2008, 2:15 PM

  Authors

  • Martin Bischoff

    • Fraunhofer IOF Jena

  • Maik Sode

    • Fraunhofer IOF Jena

  • Dieter Gaebler

    • Fraunhofer IOF Jena

  • Norbert Kaiser

    • Fraunhofer IOF Jena

  • Andreas Tuennermann

    • Fraunhofer IOF Jena

  View abstract →