Fluorocarbon Plasmas II

Presentations

• Control of Fluorocarbon Plasmas for Next-Generation ULSI Devices

  COFFEE_KLATCH · Invited

  Oct. 16, 2008, 9:00 AM – Oct. 16, 2008, 9:30 AM

  Authors

  • Tetsuya Tatsumi

    • Sony Corporation

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• New insights into fundamental ion-surface interactions

  COFFEE_KLATCH · Invited

  Oct. 16, 2008, 9:30 AM – Oct. 16, 2008, 10:00 AM

  Authors

  • Michael Gordon

    • University of California - Santa Barbara

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• Electron Scattering from Fluorocarbons and Their Radicals

  COFFEE_KLATCH · Invited

  Oct. 16, 2008, 10:00 AM – Oct. 16, 2008, 10:30 AM

  Authors

  • Todd Maddern

    • Flinders University

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• Molecular dynamics simulations of blanket and small feature etching in fluorocarbon- and fluorine-containing plasmas

  COFFEE_KLATCH · Invited

  Oct. 16, 2008, 10:30 AM – Oct. 16, 2008, 11:00 AM

  Authors

  • Joseph Vegh

    • University of California, Berkeley, Dept. of Chem. Eng.

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