Fluorocarbon Plasmas I
FOCUS · PR1 ·
Presentations
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Study of the ion induced etching for Si and SiO2 with F+ and CFX(X=1,2,3)+ ions
COFFEE_KLATCH · Invited
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Authors
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Kazuhiro Karahashi
- Osaka University
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Initial Formation of Carbon Nanowalls Synthesized by Ar Ions and CF$_{X}$/H Radicals
ORAL
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Authors
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Shingo Kondo
- Nagoya University
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Olivera Stepanovic
- Nagoya University
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Makoto Sekine
- Nagoya University
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Masaru Hori
- Nagoya University
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Koji Yamakawa
- Katagiri Engineering Co., Ltd.
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Shoji Den
- Katagiri Engineering Co., Ltd.
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Mineo Hiramatsu
- Meijo University
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Critical roles of CF$_{4}$ and SiCl$_{4}$ plasma treatments on AlGaN/GaN transistor performance
ORAL
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Authors
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Anirban Basu
- University of Illinois
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Ilesanmi Adesida
- University of Illinois
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On the effect of additional CF$_2$ scattering data on a CF$_4$/O$_2$ plasma etch simulation
ORAL
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Authors
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James J. Munro
- University College London, Gower Street, WC1E 6BT, UK
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Natasha Doss
- University College London, Gower Street, WC1E 6BT, UK
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Jonathan Tennyson
- University College London, Gower Street, WC1E 6BT, UK
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Song-Yun Kang
- Tokyo Electron Limited, Technology Development Center, 650 Mitsuzawa, Hosaka-cho, Nirasaki-Shi, Yamanashi, Japan 407-0194
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Masato Kawakami
- Tokyo Electron Limited, Technology Development Center, 650 Mitsuzawa, Hosaka-cho, Nirasaki-Shi, Yamanashi, Japan 407-0194
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Sumie Segawa
- Tokyo Electron Limited, Technology Development Center, 650 Mitsuzawa, Hosaka-cho, Nirasaki-Shi, Yamanashi, Japan 407-0194
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Li$^{+}$ attachment mass spectrometric investigation of high-mass neutral species in the downstream region of Ar/CF$_{4}$, Ar/CF$_{4}$/O$_{2}$ and Ar/CF$_{4}$/H$_{2}$ plasmas
ORAL
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Authors
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Kenji Furuya
- Kyushu University
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Hiroshi Okumura
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Yuji Tamai
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Akihiro Ide
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Akira Harata
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