Plasma-Surface Interactions
FOCUS · DT1 ·
Presentations
-
Study of elementary processes of plasma-wall interaction in fusion devices by means of an inductively coupled hydrogen plasma in interaction with graphite surfaces
COFFEE_KLATCH · Invited
–
Authors
-
Gilles Cartry
- PIIM, CNRS - Universite de Provence
-
-
Manipulation of the bombarding ion energy distribution in fluorocarbon plasma etching
ORAL
–
Authors
-
Amy Wendt
- University of Wisconsin - Madison
-
Frank Buzzi
- University of Wisconsin - Madison
-
Yuk-Hong Ting
- University of Wisconsin - Madison
-
-
Atomic-scale cellular model and profile simulation of Si etching in chlorine- and bromine-containing plasmas: Effects of surface oxidation on evolution of feature profiles
ORAL
–
Authors
-
Hirotaka Tsuda
-
Shoki Irie
-
Masahito Mori
-
Hiroaki Ohta
-
Koji Eriguchi
-
Kouichi Ono
- Kyoto University
-
-
Mechanistic model of atomic recombination
ORAL
–
Authors
-
J.D. Guha
- University of Houston
-
V.M. Donnelly
- University of Houston
-
-
Surface loss rate of H and N radicals in H$_{2}$/N$_{2}$ plasma etching process
ORAL
–
Authors
-
Chang Sung Moon
-
Keigo Takeda
-
Toshio Hayashi
- Nagoya University
-
Seigo Takashima
- Nagoya Urban Industries Promotion Corp.
-
Makoto Sekine
- Nagoya Univ. and JST-CREST
-
Yuichi Setsuhara
- Osaka Univ. and JST-CREST
-
Masaharu Shiratani
- Kyushu Univ. and JST-CREST
-
Masaru Hori
- Nagoya Univ. and JST-CREST
-
-
ABSTRACT WITHDRAWN
–
-
Effects of Remote Plasma Treatment on Surface Defects in ZnO Nanopowders
ORAL
–
Authors
-
Jorge Paramo
- Texas Christian University
-
Raul Peters
- Texas Christian University
-
Yuri Strzhemechny
- Texas Christian University
-