Materials Processing in Low Pressure Plasmas II: Etching, deposition, new materials

Presentations

• Reaction of Fluorocarbon Species with Si and SiO$_{2}$ Surfaces

  COFFEE_KLATCH · Invited

  Oct. 5, 2007, 8:00 AM – Oct. 5, 2007, 8:30 AM

  Authors

  • Hirotaka Toyoda

    • Nagoya University

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• Modeling high aspect ratio contact etch of SiO$_{2}$

  ORAL

  Oct. 5, 2007, 8:30 AM – Oct. 5, 2007, 8:45 AM

  Authors

  • Phillip Stout

    • Applied Materials

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• Time dependence analysis of the 3D profile charging during $SiO_2$ etching in $Ar^{+}$/$CF_4$ plasma

  ORAL

  Oct. 5, 2007, 8:45 AM – Oct. 5, 2007, 9:00 AM

  Authors

  • Branislav Radjenovic

    • Vinca Institute of Nuclear Science

  • Marija Radmilovic-Radjenovic

    • Institute of Physics

  • Zoran Petrovic

    • Institute of Physics
    • Institute of Physics Belgrade, Serbia
    • Institute of Physics, Belgrade

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• Plasma Modeling for Cu barrier/seed applications

  ORAL

  Oct. 5, 2007, 9:00 AM – Oct. 5, 2007, 9:15 AM

  Authors

  • Prashanth Kothnur

    • Novellus Systems, Inc.

  • Ananth Bhoj

    • Novellus Systems, Inc.

  • Ron Kinder

    • Novellus Systems, Inc.

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• Spatial distributions of Cu particulates in high-pressure magnetron sputtering plasmas studied by laser light scattering

  ORAL

  Oct. 5, 2007, 9:15 AM – Oct. 5, 2007, 9:30 AM

  Authors

  • N. Nafarizal

    • Nagoya University, University Tun Hussein Onn Malaysia

  • N. Takada

    • Nagoya University

  • K. Sasaki

    • Plasma Nanotechnology Research Center, Nagoya University
    • Nagoya University

  • M. Ikeda

    • Canon ANELVA Corporation

  • Y. Sago

    • Canon ANELVA Corporation

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• Multi-hollow discharge plasma CVD reactor with magnets for highly stable a-Si:H film deposition

  ORAL

  Oct. 5, 2007, 9:30 AM – Oct. 5, 2007, 9:45 AM

  Authors

  • Kazunori Koga

    • Kyushu University

  • William M. Nakamura

    • Kyushu University

  • Hiroshi Satou

    • Kyushu University

  • Hiroomi Miyahara

    • Kyushu University

  • Masaharu Shiratani

    • Kyushu University

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• Control of structures of Carbon Nanowalls in plasma enhanced CVD

  ORAL

  Oct. 5, 2007, 9:45 AM – Oct. 5, 2007, 10:00 AM

  Authors

  • Wakana Takeuchi

    • Nagoya. Univ.

  • Yutaka Tokuda

    • Aichi Inst. Tech.

  • Mineo Hiramatsu

    • Meijo Univ.

  • Hiroyuki Kano

    • NU-Eco Eng

  • Masaru Hori

    • Nagoya Univ.

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