Electronegative Plasmas
FOCUS · ET2 ·
Presentations
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Plasma-Based Low Energy Ion Implantation
COFFEE_KLATCH · Invited
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Authors
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Ludovic Godet
- Varian Semiconductor Equipment Associates
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Theory and particle-in-cell simulation of ion-ion plasmas
ORAL
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Authors
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Pascal Chabert
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Gary Leray
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Albert Meige
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Jean-Luc Raimbault
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Propagating double layers in electronegative plasmas
ORAL
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Authors
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Albert Meige
- LPTP, Ecole Polytechnique
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Nicolas Plihon
- LPTP, Ecole Polytechnique
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Gerjan Hagelaar
- LPTP, Ecole Polytechnique
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Jean-Pierre Boeuf
- LPTP, Ecole Polytechnique
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Pascal Chabert
- LPTP, Ecole Polytechnique
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Rod Boswell
- LPTP, Ecole Polytechnique
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Very High Frequency Capacitively Coupled Plasmas of Electronegative Gases
ORAL
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Authors
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Shahid Rauf
- Applied Materials, Inc.
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Kallol Bera
- Applied Materials, Inc.
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Alex Paterson
- Applied Materials, Inc.
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Ken Collins
- Applied Materials, Inc.
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Fast silicon etching by plasma-sheath-lens focused negative ions
ORAL
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Authors
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Eugen Stamate
- Risoe National Laboratory, Technical University of Denmark
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Plasma Characterization of Electronegatively diluted VHF CCP Plasmas
ORAL
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Authors
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Alex Paterson
- Applied Materials
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Ned Hammond
- Applied Materials
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Shahid Rauf
- Applied Materials
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Ed Barnat
- Sandia National Laboratories
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Paul Miller
- Sandia National Laboratories
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Greg Hebner
- Sandia National Laboratories
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Formation of ion flux in low frequency and low pressure ccrf discharge
ORAL
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Authors
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I.V. Schweigert
- Institute of Theoretical and Applied Mechanics, 630090 Novosibirsk, Russia
- Institute of Theoretical and Applied Mechanics SBRAS
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